Impact of Cu electrode on switching behavior in a Cu/HfO2/Pt structure and resultant Cu ion diffusion

Applied Physics Express

Volumn 2, Issue 6, 2009, Pages

  Haemori, Masamitsu ^a   Nagata, Takahiro ^a   Chikyow, Toyohiro ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CU ELECTRODE; CURRENT-VOLTAGE MEASUREMENTS; FORMING PROCESS; ION DIFFUSION; ON/OFF RATIO; PATH FORMATION; POLYCRYSTALLINE; RESISTIVE SWITCHING; ROOM TEMPERATURE; SWITCHING BEHAVIORS; SWITCHING DEVICES; SWITCHING PERFORMANCE; VOLTAGE SWEEP;

DIFFUSION; ELECTRIC POTENTIAL; HAFNIUM COMPOUNDS; HEAVY IONS; PLATINUM; SWITCHING;

COPPER;

EID: 67949121971     PISSN: 18820778     EISSN: 18820786     Source Type: Journal    
DOI: 10.1143/APEX.2.061401     Document Type: Article

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