Electron multibeam technology for mask and wafer writing at 0.1 nm address grid

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 12, Issue 3, 2013, Pages

  Platzgummer, Elmar ^a   Klein, Christof ^a   Loeschner, Hans ^a  

^a IMS NANOFABRICATION AG   (Austria)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; MASKS; TOOLS;

COMPLEX PATTERN; FURTHER DEVELOPMENT; HIGH-VOLUME MANUFACTURING; MULTIBEAM TECHNOLOGY; PERFORMANCE CAPABILITY; PRODUCTIVITY ENHANCEMENT; PROOF OF CONCEPT; THREE ORDERS OF MAGNITUDE;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 84889648533     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.JMM.12.3.031108     Document Type: Article

References (19)

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