EMET POC: Realization of a proof-of-concept 50 keV electron multibeam Mask Exposure Tool

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8166, Issue , 2011, Pages

  Platzgummer, Elmar ^a   Klein, Christof ^a   Loeschner, Hans ^a  

^a IMS NANOFABRICATION AG   (Austria)

Author keywords

Aperture plate system; Electron beam projection optics; Mask writing; Multi beam; Template writing

Indexed keywords

APERTURE PLATE; BEAM CURRENTS; BEAM SIZE; ELECTRON BEAM PROJECTION OPTICS; EXPOSURE TOOL; MASK BLANK; MASK WRITER; MASK WRITING; MULTI-BEAM; PARALLEL BEAMS; PROJECT PLANS; PROOF OF CONCEPT; ROADMAP; TEST PATTERN;

ELECTRON BEAMS; EXPOSURE METERS; LASER INTERFEROMETRY;

PHOTOMASKS;

EID: 81455147494     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.895523     Document Type: Conference Paper

References (6)

1. Shusuke Yoshitake, Takashi Kamikubo, Noriaki Nakayamada, Kiyoshi Hattori, Hiroyoshi Ando, Tomohiro Iijima, Kenji Ohtoshi, Kenichi Saito, Ryoichi Yoshikawa, Shuichi Tamamushi, Rikio Tomiyoshi, Hitoshi Higurashi, Yoshiaki Hattori, Seiichi Tsuchiya, Masayuki Katoh, Kouichi Suzuki, Yuichi Tachikawa, Munehiro Ogasawara, Victor Katsap, Steven D. Golladay, and Rodney A. Kendall, Proc. SPIE 8166, 8166-38 (2011).
2. Elmar Platzgummer, and Hans Loeschner, US Patent Application Publication, US 2011/0204253 A1 (2011).
3. Elmar Platzgummer, Proc. SPIE 7637, 7637-02 (2010).
4. Elmar Platzgummer, Stefan Cernusca, Christof Klein, Jan Klikovits, Samuel Kvasnica, and Hans Loeschner, Proc. SPIE 7823, 7823-07 (2010).
5. Christof Klein, Jan Klikovits, Hans Loeschner, and Elmar Platzgummer, Proc. SPIE 7970, 7970-11 (2011).
6. Sang-Hee Lee, Jin Choi, Hee-Bom Kim, Byung-Gook Kim, and Han-Ku Cho, Proc. SPIE 8166, 8166-36 (2011).