Results of proof-of-concept 50keV electron multi-beam mask exposure tool (eMET POC)

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8441, Issue , 2012, Pages

  Platzgummer, Elmar ^a   Klein, Christof ^a   Loeschner, Hans ^a  

^a IMS NANOFABRICATION AG   (Austria)

Author keywords

Electron beam projection optics; Electron multi beam technology; Mask writer; Programmable multi beams

Indexed keywords

EXPOSURE METERS; LITHOGRAPHY; PHOTOMASKS;

ELECTRON-BEAM PROJECTION; ELECTRON-OPTICAL COLUMNS; INVERSE LITHOGRAPHY; LONG-RANGE CORRECTIONS; MASK WRITER; MULTIBEAMS; PROOF OF CONCEPT; PROXIMITY EFFECT CORRECTION;

ELECTRONS;

EID: 84878394655     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.978999     Document Type: Conference Paper

References (5)

1. Elmar Platzgummer, "Maskless Lithography and Nanopatterning with Electron and Ion Multi-Beam Projection", Proc. SPIE 7637, 763703 (2010).
2. Elmar Platzgummer et al., "eMET POC: Realization of a proof-of-concept 50 keV electron multibeam Mask Exposure Tool", Proc. SPIE 8166, 816622 (2011).
3. Christof Klein et al., "50 keV electron Multibeam Mask Writer for the 11nm HP node: 1st results of the Proof of Concept Tool (eMET POC)", Proc. SPIE 8323, 8323-15 (2012).
4. Elmar Platzgummer et al., "eMET-50keV electron Mask Exposure Tool: Development based on proven multi-beam projection technology", Proc. SPIE 7823, (2010).
5. Elmar Platzgummer et al., "Printing results of a proof-of-concept 50keV electron multi-beam mask exposure tool (eMET POC)", Abstract submitted to SPIE Photomask BACUS 2012, Monterey, Sept 10-13, 2012.