The requirements for the future e-beam mask writer; Statistical analysis of pattern accuracy

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8166, Issue , 2011, Pages

  Lee, Sang Hee ^a   Choi, Jin ^a   Kim, Hee Bom ^a   Kim, Byung Gook ^a   Cho, Han Ku ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

CD uniformity; E beam lithography; E beam mask writer; Field position error; Image placement; LER; Shot count; Shot noise; Shot position error; VSB

Indexed keywords

CD UNIFORMITY; E-BEAM LITHOGRAPHY; E-BEAM MASK WRITER; IMAGE PLACEMENTS; LER; POSITION ERRORS; SHOT COUNT; VSB;

ELECTRON BEAM LITHOGRAPHY; MACHINE DESIGN; NANOTECHNOLOGY; SHOT NOISE; SOLID STATE LASERS;

PHOTOMASKS;

EID: 81455137659     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.896977     Document Type: Conference Paper

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