Multi Shaped Beam: Development status and update on lithography results

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7970, Issue , 2011, Pages

  Slodowski, Matthias ^a   Doering, Hans Joachim ^a   Dorl, Wolfgang ^a   Stolberg, Ines A ^a  

^a Vistec Electron Beam GmbH   (Germany)

Author keywords

Direct write; Electron beam lithography; Mask making; Maskless; MSB; Multi Shaped Beam; Variable Shaped Beam; VSB

Indexed keywords

DIRECT WRITE; MASK LESS; MASK MAKING; MSB; SHAPED BEAM; VARIABLE SHAPED BEAM; VSB;

DESIGN; ELECTRON BEAMS; MASKS; TECHNOLOGY;

ELECTRON BEAM LITHOGRAPHY;

EID: 79955926101     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.879446     Document Type: Conference Paper

References (7)

1. ITRS Roadmap, http://www.itrs.net/Links/2010ITRS/Home2010.htm
2. K. Ronse, "E-beam maskless lithography: prospects and challenges", Proc. of SPIE, Vol. 7637, 2010
3. SEMATECH Litho Workshop, May 2010
4. M. Slodowski et al., "Multi Shaped Beam Proof of Lithography", Proc. of SPIE, Vol. 7637, 2010
5. M. Wieland et al., "MAPPER: high throughput maskless lithography", Proc. of SPIE Vol. 7637, 2010
6. C. Klein et al., "50kV electron-beam projection maskless lithography (PML2): results obtained with 2,500 programmable 12.5-nm sized beams", Proc. of SPIE Vol. 7637, 2010
7. Slodowski, M. et al., "Coulomb Blur Advantage of a Multi Shaped Beam Lithography Approach", Proc. SPIE 7271-26 (2009)