Reflective electron-beam lithography performance for the 10 nm logic node

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8522, Issue , 2012, Pages

  Freed, Regina ^a   Gubiotti, Thomas ^a   Sun, Jeff ^a   Cheung, Anthony ^a   Yang, Jason ^a   McCord, Mark ^a   Petric, Paul ^a   Carroll, Allen ^a   Ummethala, Upendra ^a   Hale, Layton ^a   Hench, John ^a   Kojima, Shinichi ^a   Mieher, Walter ^a   Bevis, Chris F ^a  

^a KLA TENCOR CORPORATION   (United States)

Author keywords

Digital Pattern Generator; Direct write; Electron beam; Lithography; REBL; Roadmap

Indexed keywords

COMPUTER CIRCUITS; ELECTRON BEAMS; ELECTRONS; LITHOGRAPHY; NANOTECHNOLOGY; PHOTOLITHOGRAPHY; PHOTOMASKS; SEMICONDUCTOR DEVICE MANUFACTURE;

DIGITAL PATTERNS; DIRECT WRITE; DIRECT-WRITE LITHOGRAPHY; MASK-LESS LITHOGRAPHY; REBL; ROADMAP; SEMICONDUCTOR EQUIPMENT INDUSTRY; SEMICONDUCTOR MANUFACTURING;

ELECTRON BEAM LITHOGRAPHY;

EID: 85077084065     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.964978     Document Type: Conference Paper

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