Throughput enhancement technique for MAPPER maskless lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7637, Issue , 2010, Pages

  Wieland, M J ^a   Derks, H ^a   Gupta, H ^a   Van De Peut, T ^a   Postma, F M ^a   Van Veen, A H V ^a   Zhang, Y ^a  

^a MAPPER Lithography BV   (Netherlands)

Author keywords

electron beam; lithography; MAPPER; maskless; parallel; throughput

Indexed keywords

BEAM CURRENTS; DISPENSER CATHODES; DOUBLE PATTERNING; ELECTRON BEAM WRITING; EMISSION CURRENT; HIGH BRIGHTNESS; HIGH EMISSION CURRENT; HIGH THROUGHPUT; KEY COMPONENT; MAPPER; MASK LESS; MASK-LESS LITHOGRAPHY; OPTICAL CONFIGURATIONS; OPTICAL DATA; PATTERNED BEAMS; PROJECTION LENS; ROADMAP; SPOT SIZES; TECHNOLOGY NODES; TECHNOLOGY-BASED; THROUGHPUT ENHANCEMENT; UNIFORM EMISSION;

ELECTRON BEAMS; ELECTRON OPTICS; ELECTRON SOURCES; ELECTRONS; LENSES; OPTICAL DESIGN; OPTICAL INSTRUMENTS; TECHNOLOGY; THROUGHPUT;

LITHOGRAPHY;

EID: 77953318303     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.849447     Document Type: Conference Paper

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