SCOPUS 정보 검색 플랫폼

Volumn 548, Issue , 2013, Pages 195-201

Dielectric properties and X-ray photoelectron spectroscopic studies of niobium oxide thin films prepared by direct liquid injection chemical vapor deposition method

(2) Bharti, Dinesh Chand a Rhee, Shi Woo a

a Pohang University of Science and Technology (POSTECH) (South Korea)

Author keywords

Dielectric constant; Direct liquid injection chemical vapor deposition; Nb(OC2H5)5; Nb2O5; Thin films; X ray photoelectron spectroscopy

Indexed keywords

CRYSTALLINE FILMS; DEPOSITION TEMPERATURES; FILMS PROPERTIES; HIGH DIELECTRIC CONSTANTS; LIQUID INJECTIONS; OXIDE THIN FILMS; SPECTROSCOPIC STUDIES; X-RAY PHOTOELECTRONS;

CHEMICAL VAPOR DEPOSITION; CRYSTALLINE MATERIALS; DEPOSITION; DIELECTRIC PROPERTIES; LEAKAGE CURRENTS; LIQUIDS; NIOBIUM OXIDE; OXYGEN; PERMITTIVITY; PHOTOELECTRONS; SPECTROSCOPIC ANALYSIS; SURFACE ROUGHNESS; THIN FILMS; VAPORS; X RAY PHOTOELECTRON SPECTROSCOPY;

DIELECTRIC MATERIALS;

EID: 84887446689 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2013.09.063 Document Type: Article

Times cited : (20)

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