메뉴 건너뛰기




Volumn 519, Issue 10, 2011, Pages 3068-3073

Growth, structure and properties of sputtered niobium oxide thin films

Author keywords

Niobium oxide; Optical properties; Oxygen; Reactive sputtering; Surface morphology; Thin films; X ray photoelectron spectroscopy

Indexed keywords

FILM PROPERTIES; FOUR POINT PROBE; OXIDE THIN FILMS; OXYGEN FLOW RATES; PULSED DC MAGNETRON SPUTTERING; STRUCTURE AND PROPERTIES; TOTAL GAS PRESSURE; TOTAL PRESSURE; VARIABLE ANGLE SPECTROSCOPIC ELLIPSOMETRY;

EID: 79952315684     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.12.036     Document Type: Article
Times cited : (41)

References (18)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.