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Volumn 519, Issue 10, 2011, Pages 3068-3073
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Growth, structure and properties of sputtered niobium oxide thin films
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Author keywords
Niobium oxide; Optical properties; Oxygen; Reactive sputtering; Surface morphology; Thin films; X ray photoelectron spectroscopy
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Indexed keywords
FILM PROPERTIES;
FOUR POINT PROBE;
OXIDE THIN FILMS;
OXYGEN FLOW RATES;
PULSED DC MAGNETRON SPUTTERING;
STRUCTURE AND PROPERTIES;
TOTAL GAS PRESSURE;
TOTAL PRESSURE;
VARIABLE ANGLE SPECTROSCOPIC ELLIPSOMETRY;
ATOMIC FORCE MICROSCOPY;
ATOMIC SPECTROSCOPY;
ELECTRONS;
MORPHOLOGY;
NIOBIUM;
OPTICAL PROPERTIES;
OXIDE FILMS;
OXYGEN;
PHOTOELECTRICITY;
PHOTONS;
SPECTROSCOPIC ELLIPSOMETRY;
SURFACE MORPHOLOGY;
THIN FILMS;
X RAY PHOTOELECTRON SPECTROSCOPY;
X RAYS;
NIOBIUM OXIDE;
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EID: 79952315684
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2010.12.036 Document Type: Article |
Times cited : (41)
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References (18)
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