Thickness effect on properties of titanium film deposited by d.c. magnetron sputtering and electron beam evaporation techniques

Bulletin of Materials Science

Volumn 36, Issue 5, 2013, Pages 807-812

  Arshi, Nishat ^a   Lu, Junqing ^a   Lee, Chan Gyu ^a   Yoon, Jae Hong ^a   Koo, Bon Heun ^a   Ahmed, Faheem ^a  

^a Changwon National University   (South Korea)

Author keywords

Atomic force microscopy (AFM); Electron microscopy.; Hardness; Surfaces; Thin films; X ray diffraction

Indexed keywords

D.C. MAGNETRON SPUTTERING; E BEAM EVAPORATION; ELECTRON BEAM EVAPORATION; FIELD EMISSION SCANNING ELECTRON MICROSCOPY; FOUR-POINT PROBE; MORPHOLOGICAL CHARACTERIZATION; PREFERRED ORIENTATIONS; THICKNESS EFFECT;

ATOMIC FORCE MICROSCOPY; ELECTRON MICROSCOPY; EVAPORATION; FIELD EMISSION MICROSCOPES; HARDNESS; PHOTOELECTRONS; SURFACES; THIN FILMS; TITANIUM; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

MAGNETRON SPUTTERING;

EID: 84886921058     PISSN: 02504707     EISSN: None     Source Type: Journal    
DOI: 10.1007/s12034-013-0552-2     Document Type: Article

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