Residual strain in deuterated Ti thin films

Materials Letters

Volumn 36, Issue 1-4, 1998, Pages 1-6

  Scardi, P ^a   Leoni, M ^a   Checchetto, R ^a  

^a UNIVERSITY OF TRENTO   (Italy)

Author keywords

PVD techniques; Residual strain; Thin films; Ti D system

Indexed keywords

CRYSTAL ORIENTATION; DEUTERIUM; ELECTRON BEAMS; EVAPORATION; METALLIC FILMS; RESIDUAL STRESSES; SEMICONDUCTING SILICON; TEXTURES; THERMAL EXPANSION; THIN FILMS; VAPOR DEPOSITION; X RAY CRYSTALLOGRAPHY;

PHYSICAL VAPOR DEPOSITION (PVD);

TITANIUM;

EID: 0032121671     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-577X(97)00286-3     Document Type: Article

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