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Volumn 188-189, Issue 1-3 SPEC.ISS., 2004, Pages 260-264
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Fabrication of nanostructured titanium thin films via N ion implantation and postannealing treatment
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Author keywords
Ion beam sputter; Ion Implantation; Nitride; TEM; XPS
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Indexed keywords
ION BEAMS;
ION IMPLANTATION;
NANOSTRUCTURED MATERIALS;
SILICON;
SPUTTERING;
TITANIUM;
TRANSMISSION ELECTRON MICROSCOPY;
X RAY PHOTOELECTRON SPECTROSCOPY;
ION BEAM SPUTTERING (IBS);
LOW TEMPERATURE NONEQUILIBRIUM PROCESSES;
PHASE DECOMPOSITION;
POSTANNEALING TREATMENT;
THIN FILMS;
FILM;
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EID: 14644416576
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/j.surfcoat.2004.08.040 Document Type: Article |
Times cited : (11)
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References (12)
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