Microstructural characterizations of magnetron sputtered Ti films on glass substrate

Journal of Materials Processing Technology

Volumn 209, Issue 7, 2009, Pages 3444-3451

  Chawla, Vipin ^a   Jayaganthan, R ^a   Chawla, A K ^a   Chandra, Ramesh ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY ROORKEE   (India)

Author keywords

Microstructural characterization; Sputtering; Ti thin films

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHARACTERIZATION; DIFFRACTION; ELECTRODEPOSITION; GLASS; MAGNETRONS; SCANNING; SCANNING ELECTRON MICROSCOPY; SURFACE ROUGHNESS; THIN FILMS; TITANIUM; X RAY DIFFRACTION; X RAY POWDER DIFFRACTION;

ATOMIC FORCES; AVERAGE SURFACE ROUGHNESS; DENSE FILMS; DEPOSITION PARAMETERS; GLASS SUBSTRATES; GRAIN SIZES; MICROSTRUCTURAL CHARACTERIZATION; PREFERRED ORIENTATIONS; SCANNING ELECTRONS; SPUTTERING POWER; SPUTTERING PRESSURES; SUBSTRATE TEMPERATURES; TI FILMS; TI THIN FILMS; X- RAY DIFFRACTIONS; X-RAY DIFFRACTION ANALYSIS;

SUBSTRATES;

EID: 62949154747     PISSN: 09240136     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jmatprotec.2008.08.004     Document Type: Article

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