The structural and mechanical properties of Ti films fabricated by using RF magnetron sputtering

Journal of the Korean Physical Society

Volumn 51, Issue 3, 2007, Pages 1152-1155

  Song, Y H ^a   Cho, S J ^a   Jung, C K ^a   Bae, I S ^a   Boo, J H ^a   Kim, S ^b  

^a Sungkyunkwan University   (South Korea)

^b Kookmin University   (South Korea)

Author keywords

RF magnetron sputter; Structural and mechanical properties; Ti thin film; Various substrates

Indexed keywords

EID: 34948899835     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: 10.3938/jkps.51.1152     Document Type: Article

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