Nanocomposite Ag:TiN thin films for dry biopotential electrodes

Applied Surface Science

Volumn 285, Issue PARTA, 2013, Pages 40-48

  Pedrosa, P ^a,b,c   Machado, D ^c   Lopes, C ^c   Alves, E ^d   Barradas, N P ^e   Martin, N ^f   Macedo, F ^c   Fonseca, C ^a,b   Vaz, F ^c  

^a UNIVERSITY OF COIMBRA   (Portugal)

^b UNIVERSITY OF PORTO   (Portugal)

^c UNIVERSITY OF MINHO   (Portugal)

^d UNIVERSITY OF LISBON   (Portugal)

^e INSTITUTO SUPERIOR TÉCNICO   (Portugal)

^f UNIVERSITÉ DE FRANCHE COMTÉ   (France)

Author keywords

Ag addition; Biopotential electrodes; Dry electrodes; ECG; EEG; Electrical resistivity, Thermal properties; RBS; TiN; XRD

Indexed keywords

COATINGS; ELECTRIC CONDUCTIVITY; ELECTROCARDIOGRAPHY; ELECTRODES; ELECTROENCEPHALOGRAPHY; GRAIN GROWTH; HEAT CONDUCTION; NANOCOMPOSITE FILMS; REACTIVE SPUTTERING; RUBIDIUM; STRUCTURE (COMPOSITION); SUBSTRATES; THERMODYNAMIC PROPERTIES; THIN FILMS; TIN; TITANIUM NITRIDE;

AG ADDITIONS; BIOPOTENTIAL ELECTRODES; CONDUCTION MECHANISM; DC REACTIVE SPUTTERING; DRY ELECTRODE; MORPHOLOGICAL FEATURES; MORPHOLOGY AND STRUCTURES; RESISTIVITY VALUES;

SILVER COMPOUNDS;

EID: 84886086266     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2013.07.154     Document Type: Article

References (57)

1. M. Teplan Meas. Sci. Rev. 2 2 2002 1 11
2. E. McAdams Bioelectrodes J.G. Webster, Encyclopaedia of Medical Devices and Instrumentation 1988 Wiley New York 120 166
3. A. Searle, and L. Kirkup Physiol. Meas. 22 2000 271 283
4. W.K. Ko, and J. Hynecek Dry electrodes and electrode amplifiers H.A. Miller, D.C. Harrison, Biomedical Electrode Technology 1974 Academic Press New York
5. L.T. Cunha, P. Pedrosa, C.J. Tavares, E. Alves, F. Vaz, and C. Fonseca Electrochim. Acta 55 1 2009 59 67
6. G. Gargiulo, R.A. Calvo, P. Bifulco, M. Cesarelli, C. Jin, A. Mohamed, and A. van Schaik Clin. Neurophysiol. 121 5 2010 686 693
7. C. Fonseca, J.P. Silva Cunha, R.E. Martins, V. Ferreira, J.P. Marques de Sá, M.A. Barbosa, and A. Martins Silva IEEE Trans. Biomed. Eng. 54 1 2007 162 165
8. K.-P. Hoffmann, and R. Ruff Proceedings of the 29th Annual International Conference of the IEEE EMBS Lyon, France, August 2007 23 26
9. J. Baek, J. An, J. Choi, K. Park, and S. Lee Sens. Actuat. A 143 2008 423 429
10. A. Gruetzmann, S. Hansen, and J. Muller Physiol. Meas. 28 2007 1375 1390
11. V. Marozas, A. Petrenas, S. Daukantas, and A. Lukosevicius J. Electrocardiol. 44 2011 189 194
12. S. Piscanec, L. Ciacchi, E. Vesselli, G. Comelli, O. Sbaizero, S. Meriani, and A. De Vita Acta Mater. 52 2004 1237
13. P. Pedrosa, E. Alves, N.P. Barradas, P. Fiedler, J. Haueisen, F. Vaz, and C. Fonseca Corros. Sci. 56 2012 49 57
14. S.L. Chui, J. Leu, and P.S. Ho J. Appl. Phys. 76 1994 5136
15. O. Kraft, M. Hommel, and E. Arzt Mater. Sci. Eng., A 288 2000 209
16. M. Hommel, and O. Kraft Acta Mater 49 2001 3935
17. B.E. Alaca, M.T.A. Saif, and H. Sehitoglu Acta Mater. 50 2002 1197
18. D.Y.W. Yu, and F. Spaepen J. Appl. Phys. 95 2003 2991
19. S.P. Lacour, S. Wagner, Z. Huang, and Z. Suo Appl. Phys. Lett. 82 2003 2404
20. Y. Xiang, T. Li, Z. Suo, and J. Vlassak Appl. Phys. Lett. 87 2005 161910
21. R.M. Niu, G. Liu, C. Wang, G. Zhang, X.D. Ding, and J. Sun Appl. Phys. Lett. 90 2007 161907
22. R.X. Wang, X.M. Tao, Y. Wang, G.F. Wang, and S.M. Shang Surf. Coat. Technol. 204 2010 1206 1210
23. R.C. Adochite, D. Munteanu, M. Torrell, L. Cunha, E. Alves, N.P. Barradas, A. Cavaleiro, J.P. Riviere, E. Le Bourhis, D. Eyidi, and F. Vaz Appl. Surf. Sci. 258 2012 4028 4034
24. H. Chiriac, M. Urse, F. Rusu, C. Hison, and M. Neagu Sens. Actuat. A 76 1999 376 380
25. K.-H. Liao, K.-L. Ou, H.-C. Cheng, C.-T. Lin, and P.-W. Peng Appl. Surf. Sci. 256 2010 3642 3646
26. M. Fiori, M. Paula, A. Bernardin, H. Riella, and E. Angioletto Mater. Sci. Eng. C 29 2009 1569 1573
27. M. Santos, C. Oliveira, C. Tachinski, M. Fernandes, C. Pich, E. Angioletto, H.G. Riella, and M. Fiori Int. J. Miner. Process. 100 2011 51 53
28. P.J. Kelly, H. Li, K.A. Whitehead, J. Verran, R.D. Arnell, and I. Iordanova Surf. Coat. Technol. 204 2009 1137 1140
29. P.J. Kelly, H. Li, P.S. Benson, K.A. Whitehead, J. Verran, R.D. Arnell, and I. Iordanova Surf. Coat. Technol. 205 2010 1606 1610
30. L.A. Geddes, L.E. Baker, and A.G. Moore Med. Biol. Eng. 7 1969 49 56
31. N.P. Barradas, C. Jeynes, and R.P. Webb Appl. Phys. Lett. 71 1997 291
32. A.F. Gurbich Nucl. Instrum. Methods 268 2010 1703
33. L.J. van der Pauw Philips Res. Rep. 13 1958 1 9
34. F. Macedo, F. Vaz, M. Torrell, R.T. Faria Jr., A. Cavaleiro, N.P. Barradas, E. Alves, K.H. Junge, and B.K. Bein J. Phys. D: Appl. Phys. 45 2012 105301
35. D. Depla, S. Heirwegh, S. Mahieu, J. Haemers, and R. De Gryse J. Appl. Phys. 101 2007 013301
36. D. Depla, G. Buyle, J. Haemers, and R. De Gryse Surf. Coat. Technol. 200 2006 4329 4338
37. D. Depla, S. Mahieu, and R. De Gryse Thin Solid Films 517 2009 2825 2839
38. J.A. Thornton J. Vac. Sci. Technol. 15 1978 171
39. J.M. Chappé, F. Vaz, L. Cunha, C. Moura, M.C. Marco de Lucas, L. Imhoff, S. Bourgeois, and J.F. Pierson Surf. Coat. Technol. 203 2008 804 807
40. J. Borges, F. Vaz, and L. Marques Appl. Surf. Sci. 257 2010 1478 1483
41. J. Borges, N. Martin, N.P. Barradas, E. Alves, D. Eyidi, M.F. Beaufort, J.P. Riviere, F. Vaz, and L. Marques Thin Solid Films 520 2012 6709 6717
42. R. Arvinte, J. Borges, R.E. Sousa, D. Munteanu, N.P. Barradas, E. Alves, F. Vaz, and L. Marques Appl. Surf. Sci. 257 2011 9120 9124
43. J.F. Pierson, D. Wiederkehr, and A. Billard Thin Solid Films 478 2005 196 205
44. V.S. Smentkowski Prog. Surf. Sci. 64 2000 1 58
45. C.D. Wanger, W.M. Riggs, L.E. Davis, J.F. Moulder, and G.E. Muilenberg Handbook of X-ray Photoelectron Spectroscopy 1979 Perkin-Elmer Corp., Physical Electronics Division Eden Prairie, Minnesota, USA
46. F. Vaz, J. Ferreira, E. Ribeiro, L. Rebouta, S. Lanceros-Méndez, J.A. Mendes, E. Alves, Ph Goudeau, J.P. Rivière, F. Ribeiro, I. Moutinho, K. Pischow, and J. de Rijk Surf. Coat. Technol. 191 2005 317 323
47. M.E. Day, M. Delfino, J.A. Fair, and W. Tsai Thin Solid Films 254 1995 285 290
48. K.-Y. Chan, T.-Y. Tou, and B.-S. Teo Microelectron. J. 37 2006 608 612
49. T. de los Arcos, P. Oelhafen, U. Aebi, A. Hefti, M. Düggelin, D. Mathys, and R. Guggenheim Vacuum 67 2002 463 470
50. Y. Xiong, H. Wu, Y. Guo, Y. Sun, D. Yang, and D. Da Thin Solid Films 375 2000 300 303
51. J.G. Han, H.S. Myung, H.M. Lee, and L.R. Shaginyan Surf. Coat. Technol. 163-164 2003 591 596
52. W. Gulbiński, and T. Suszko Surf. Coat. Technol. 201 2006 1469 1476
53. K. Fuchs Proc. Camb. Philos. Soc. 34 1938 100
54. E.H. Sondheimer Phys. Rev. 80 1950 401
55. K. Kitawaki, K. Kaneko, K. Inoke, J.C. Hernandez-Garrido, P.A. Midgley, H. Okuyama, M. Uda, and Y. Sakka Micron. 40 2009 308 312
56. P. Pedrosa, D. Machado, M. Evaristo, A. Cavaleiro, C. Fonseca, and F. Vaz Vacuum 2013 Submitted for publication
57. J.L. Nzodoum Fotsing, J. Gibkes, J. Pelzl, and B.K. Bein J. Appl. Phys. 98 2005 063522