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Volumn 545, Issue , 2013, Pages 601-607

Superconducting niobium nitride thin films by reactive pulsed laser deposition

(9) Ufuktepe, Y a Farha, A H b,f Kimura, S I c,d Hajiri, T c,e Imura, K c,e Mamun, M A b Karadag, F a Elmustafa, A A b Elsayed Ali, H E b

a CUKUROVA UNIVERSITY (Turkey)

b Old Dominion University (United States)

c INSTITUTE FOR MOLECULAR SCIENCE (Japan)

d GRADUATE UNIVERSITY FOR ADVANCED STUDIES (Japan)

e NAGOYA UNIVERSITY (Japan)

f Ain Shams University (Egypt)

Author keywords

NbN; Pulsed laser deposition; Thin films; X ray spectroscopy

Indexed keywords

CONTINUOUS STIFFNESS METHODS; HARDNESS AND MODULUS; NANOMECHANICAL PROPERTY; NBN; NITROGEN GAS PRESSURE; REACTIVE PULSED LASER DEPOSITION; SUBSTRATE TEMPERATURE; SUPERCONDUCTING PROPERTIES;

ELECTRONIC STRUCTURE; HARDNESS; NIOBIUM; NITRIDES; NITROGEN; PULSED LASER DEPOSITION; SUPERCONDUCTIVITY; THIN FILMS; X RAY SPECTROSCOPY;

SUPERCONDUCTING FILMS;

EID: 84884990381 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2013.08.051 Document Type: Article

Times cited : (26)

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