Reactive pulsed laser deposition and characterization of niobium nitride thin films

Surface and Coatings Technology

Volumn 206, Issue 6, 2011, Pages 1196-1202

  Krishnan, R ^a   David, C ^a   Ajikumar, P K ^a   Dash, S ^a   Tyagi, A K ^a   Jayaram, V ^b   Raj, Baldev ^a  

^a INDIRA GANDHI CENTRE FOR ATOMIC RESEARCH   (India)

^b INDIAN INSTITUTE OF SCIENCE   (India)

Author keywords

Nanoindentation; Niobium nitride; Proton elastic backscattering spectroscopy; Reactive pulsed laser deposition; X ray diffraction; X ray photoelectron spectroscopy

Indexed keywords

DEPOSITION PRESSURES; ELASTIC BACKSCATTERING; GAS PRESSURES; HIGH PURITY; LASER FLUENCES; LOW PRESSURES; MICROSCOPIC CHARACTERIZATION; NANOINDENTATION TECHNIQUES; NBN THIN FILM; NIOBIUM NITRIDE; NIOBIUM TARGET; NITROGEN GAS; NON EQUILIBRIUM; NON-STOICHIOMETRY; OPTIMIZED CONDITIONS; PROCESS VARIABLES; REACTIVE PULSED LASER DEPOSITION; SUBSTRATE TEMPERATURE; SYSTEMATIC STUDY; THIN FILM ARCHITECTURES;

BACKSCATTERING; DEPOSITION; DIFFRACTION; INDENTATION; NANOINDENTATION; NIOBIUM; NITRIDES; NITROGEN; OPTIMIZATION; PHOTOELECTRICITY; PHOTOELECTRON SPECTROSCOPY; PHOTONS; PRESSURE EFFECTS; PROTONS; PULSED LASER DEPOSITION; SECONDARY ION MASS SPECTROMETRY; STOICHIOMETRY; THIN FILMS; VAPOR DEPOSITION; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

PULSED LASERS;

EID: 80055110462     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2011.08.028     Document Type: Article

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