Generation of micropatterns of conducting polymers and aluminum using an intermediate-layer lithography approach and some applications

Microsystem Technologies

Volumn 15, Issue 10-11, 2009, Pages 1605-1617

  Luo, Cheng ^a  

^a University of Texas at Arlington   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; LITHOGRAPHY; MOLDS;

CHEMICAL SOLUTIONS; DRY ETCHING PROCESS; ELECTRICAL APPLICATIONS; ENVIRONMENTAL CONDITIONS; HIGH CONDUCTIVITY; INSULATING POLYMER; INTERMEDIATE LAYERS; TECHNICAL CHALLENGES;

CONDUCTING POLYMERS;

EID: 84884274286     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00542-009-0861-y     Document Type: Article

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