An intermediate-layer lithography method for generating multiple microstructures made of different conducting polymers

Microsystem Technologies

Volumn 13, Issue 8-10, 2007, Pages 1175-1184

  Chakraborty, Anirban ^a   Liu, Xinchuan ^a   Parthasarathi, Ganga ^a   Luo, Cheng ^a  

^a Bogard Hall M116A   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COST EFFECTIVENESS; DEGRADATION; LITHOGRAPHY; MICROSTRUCTURE; MICROSYSTEMS; SUBSTRATES; THROUGHPUT;

INTERMEDIATE-LAYER LITHOGRAPHY (ILL); MICROPATTERNS; RAISED TEMPERATURE;

CONDUCTING POLYMERS;

EID: 34548264604     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00542-006-0321-x     Document Type: Conference Paper

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