Morphology control in block copolymer films using mixed solvent vapors

ACS Nano

Volumn 6, Issue 9, 2012, Pages 8052-8059

  Gotrik, Kevin W ^a   Hannon, Adam F ^a   Son, Jeong Gon ^a   Keller, Brent ^a   Alexander Katz, Alfredo ^a   Ross, Caroline A ^a  

^a Massachusetts Institute of Technology Cambridge   (United States)

Author keywords

block copolymer; heptane; ps pdms; self assembly; self consistent field theory; solvent vapor annealing; toluene

Indexed keywords

BLOCK COPOLYMER FILMS; BLOCK COPOLYMER THIN FILMS; CRITICAL DIMENSION; DIBLOCK CO-POLYMER FILMS; DIFFERENT SOLVENTS; MIXED SOLVENT; MORPHOLOGY CONTROL; N-HEPTANES; PHASE MAPS; PRECISE CONTROL; PS-PDMS; SELF CONSISTENT FIELD THEORY; SOLVENT SWELLING; SOLVENT VAPORS;

ANNEALING; BLOCK COPOLYMERS; HEPTANE; INERT GASES; MEAN FIELD THEORY; MOLECULAR ORBITALS; MORPHOLOGY; ORGANIC SOLVENTS; POLYSTYRENES; SELF ASSEMBLY; SILICONES; SOLVENTS; TOLUENE;

VAPORS;

NANOMATERIAL; POLYMER; SOLVENT;

ADSORPTION; ARTICLE; ARTIFICIAL MEMBRANE; CHEMICAL MODEL; CHEMISTRY; CONFORMATION; CRYSTALLIZATION; GAS; MACROMOLECULE; MATERIALS TESTING; METHODOLOGY; PARTICLE SIZE; SURFACE PROPERTY; ULTRASTRUCTURE;

ADSORPTION; CRYSTALLIZATION; GASES; MACROMOLECULAR SUBSTANCES; MATERIALS TESTING; MEMBRANES, ARTIFICIAL; MODELS, CHEMICAL; MOLECULAR CONFORMATION; NANOSTRUCTURES; PARTICLE SIZE; POLYMERS; SOLVENTS; SURFACE PROPERTIES;

EID: 84866696723     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/nn302641z     Document Type: Article

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