PLAD (plasma doping) on 22nm technology node and beyond - Evolutionary and/or revolutionary

IWJT 2012 - 2012 12th International Workshop on Junction Technology

Volumn 2012-January, Issue , 2012, Pages 1-11

  Qin, Shu ^a   Jeff Hu, Y ^a   McTeer, Allen ^a  

^a MICRON TECHNOLOGY INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEVICE PERFORMANCE; DRIVE CURRENTS; NON-PLANAR DEVICES; NOVEL DIAGNOSTICS; PLASMA DOPING; PRODUCTION ENHANCEMENT; RESISTANCE REDUCTION; TECHNOLOGY NODES;

SEMICONDUCTOR DOPING;

EID: 84879900244     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/iwjt.2012.6212800     Document Type: Conference Paper

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