Electrodeposition of bismuth, tellurium, and bismuth telluride thin films from choline chloride-oxalic acid ionic liquid

Journal of Applied Electrochemistry

Volumn 43, Issue 3, 2013, Pages 309-321

  Agapescu, Camelia ^a   Cojocaru, Anca ^a   Cotarta, Adina ^a   Visan, Teodor ^a  

^a UNIVERSITY POLITEHNICA OF BUCHAREST   (Romania)

Author keywords

Bismuth; Bismuth telluride; Electrochemical deposition; Tellurium; Thin films

Indexed keywords

BISMUTH; CHLORINE COMPOUNDS; COPPER METALLOGRAPHY; CYCLIC VOLTAMMETRY; ELECTROCHEMICAL DEPOSITION; ELECTROCHEMICAL ELECTRODES; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY; ELECTROLYTES; ENERGY DISPERSIVE SPECTROSCOPY; IONIC LIQUIDS; OXALIC ACID; REDUCTION; SCANNING ELECTRON MICROSCOPY; TELLURIUM; TELLURIUM COMPOUNDS; THIN FILMS;

BISMUTH TELLURIDE; BISMUTH TELLURIDE THIN FILMS; BISMUTH-TELLURIDE FILMS; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY TECHNIQUES; ENERGY DISPERSIVE X RAY SPECTROSCOPY; MILLIMOLAR CONCENTRATIONS; REFERENCE ELECTRODES; SUPPORTING ELECTROLYTE;

BISMUTH COMPOUNDS;

EID: 84879324004     PISSN: 0021891X     EISSN: None     Source Type: Journal    
DOI: 10.1007/s10800-012-0487-0     Document Type: Article

References (63)

1. Harbough M, Mathers F.E. (1933) Trans Electrochem Soc 64:293
2. Jeffrey CA, Harrington DA, Morin S. (2002) Surf Sci 512:L367
3. Jiang S, Huang Y-H, Luo F, Du N., Yan C-H (2003) Inorg Chem Commun 6:781
4. Vereecken PM, Rodbell K, Ji C.X., Searson P.C. (2005) Appl Phys Lett 86:121916
5. Yang M, Hu Z. (2005) J Electroanal Chem 583:46
6. Valsiunas I, Miecinskas P, Gudaviciute L., Steponavicius A. (2006) Chemija 17(4):35
7. Sandnes E, Williams ME, Bertocci U, Vaudin M.D., Stafford G.R. (2007) Electrochim Acta 52:6221
8. Hocevar SB, Daniele S, Bragato C., Ogorevic B. (2007) Electrochim Acta 53:555
9. Holvoet S, Horny P, Turgeon S., Chevallier P, Pireaux J-J, Mantovani D. (2010) Electrochim Acta 55:1042
10. Zhou L, Dai Y, Zhang H., Jia Y, Zhang J, Li C. (2012) Bull Korean Chem Soc 33(5):1541
11. Hamm UW, Kramer D, Zhai R.S., Kolb D.M. (1998) Electrochim Acta 43:2969
12. Steponavicius A, Gudaviciute L, Karpaviciene V., Kapocius V. (2003) Chemija 12(1):42
13. Hara M, Nagahara Y, Inukai J., Yoshimoto S, Itaya K. (2006) Electrochim Acta 51:2327
14. Simka W, Puszczyk D, Nawrat G. (2009) Electrochim Acta 54:5307
15. Petrova TP, Zelenetskaya KV, Rakhmatullina I.F., Shapnik M.S. (2006) Prot Met 42:359
16. Perelygin YP, Kireev SY, Kireev A.Y. (2006) Russ J Appl Chem 79(7):1200
17. Tsai Y-D, Lien C-H, Hu C-C (2011) Electrochim Acta 56:7615
18. Colom F, Alonso L. (1965) Electrochim Acta 10(8):835
19. Ebe H, Ueda M, Ohtsuka T. (2007) Electrochim Acta 53:100
20. Ni Y, Zhang Y, Zhang L., Hong J. (2011) Cryst Eng Commun 13:794
21. Yang M (2011) J Mater Chem 21:3119
22. Som T, Simo A, Fenger R., Troppenz GV, Bansen R, Pfander N, Emmerling F., Rappich J, Boeck T, Rademann K. (2012) Chem Phys Chem. doi:10.1002/cphc. 201101009
23. Montiel-Santillan T., Solorza-Feria O, Sanchez-Soriano H (2002) Int J Hydr Energy 27:461
24. Santos MC, Machado SAS (2005) Electrochim Acta 50(11):2289
25. Zhu W, Yang JY, Zhou D.X., Bao SQ, Fan XA, Duan X.K. (2007) Electrochim Acta 52(11):3660
26. Ivanova YA, Ivanov DK, Streltsov E.A. (2007) Electrochim Acta 52(16):5213
27. Sadeghi M, Dastan M, Ensaf M.R., Tehrani AA, Tenreiro C, Avila M. (2008) Appl Radiat Isot 66(10):1281
28. She G, Shi W, Zhang X., Wong T, Cai Y, Wang N. (2009) Cryst Growth Des 9:663
29. Li F-H, Wang W. (2010) J Appl Electrochem 40:2005
30. Santos MC, Cabral MF, Machado SAS (2011) Electrochim Acta 58:1
31. Liftman Y, Albeck M, Goldschmidt JME, Yarnitsky C.h. (1984) Electrochim Acta 29:1673
32. Chang CH, Rheem Y, Choa Y-H, Shin DH, Park D-Y, Myung N.V. (2010) Electrochim Acta 55:743
33. Xiao F, Hangarter C, Yoo B., Rheem Y, Lee K-H, Myung N.V. (2008) Electrochim Acta 53:8103
34. Boulanger C (2010) J Electron Mater 39:1818
35. Zhu W, Yang JY, Gao X.H., Bao SQ, Fan XA, Zhang TJ, Cui K. (2005) Electrochim Acta 50(20):4041
36. Yoo BY, Huang C-K, Lim JR, Herman J, Ryan M.A., Fleurial J-P, Myung N.V. (2005) Electrochim Acta 50:4371
37. Wen S, Corderman RR, Seker F, Zhang A.P., Denault L., Blohm M.L. (2006) J Electrochem Soc 153:C595
38. Li S, Toprak MS, Soliman HMA, Zhou J, Muhammed M., Platzek D, Muller E. (2006) Chem Mater 18:3627
39. Richoux V, Diliberto S, Boulanger C., Lecuire J.M. (2007) Elec-trochim Acta 52:3053
40. Wang W-L, Wan C-C, Wang Y-Y (2007) Electrochim Acta 52:6502
41. Zimmer A, Stein N, Johann L., Beck R, Boulanger C. (2007) Electrochim Acta 52:4760
42. Li S, Soliman HMA, Zhou J, Toprak M.S., Muhammed M., Platzek D, Ziolkowski P, Müller E (2008) Chem Mater 20:4403
43. Ham S, Jeon S, Lee U., Park M, Paeng KJ, Myung N, Rajeshwar K. (2008) Anal Chem 80(17):6724
44. Diliberto S, Richoux V, Stein N., Boulanger C. (2008) Phys Status Solidi 205:2340
45. Glatz W, Durrer L, Schwyter E., Hierold C. (2008) Electrochim Acta 54(2):755
46. Chen CL, Chen YY, Lin S.J., Ho JC, Lee PC, Chen CD, Harutyunyan S.R. (2010) J Phys Chem C 114:3385
47. Ma Y, Johansson A, Ahlberg E., Palmqvist AEC (2010) Electrochim Acta 55:4610
48. Ma Y, Ahlberg E, Sun Y., Iversen BB, Palmqvist AEC (2011) Electrochim Acta 56:4216
49. Soliman HMA, Kashyout AHB (2011) Engineering 3:659
50. Erdogan IY, Demir U. (2011) Electrochim Acta 56(5):2385
51. Li W-J (2009) Electrochim Acta 54:7167
52. Nguyen HP, Wu M, Su J., Vullers RJM, Vereecken PM, Fransaer J. (2012) Electrochim Acta 68:9
53. Li W-J, Yu W-L, Yen C-Y (2011) Electrochim Acta 58:510
54. Fung YS, Zhang W.B. (1997) J Appl Electrochem 27(7):857
55. Pan G-B, Freyland W. (2007) Electrochim Acta 52(25):7254
56. Fu Y-C, Su Y-Z, Zhang H-M, Yan J-W, Xie Z-X, Mao B-W (2010) Electrochim Acta 55:8105
57. Abbott AP, Ryder KS, Konig U. (2008) Trans Inst Met Finish 86:196
58. Golgovici F, Cojocaru A, Nedelcu M., Visan T. (2009) Chalcog Lett 6(8):323
59. Golgovici F, Cojocaru A, Agapescu C., Jin Y, Nedelcu M, Wang W., Visan T. (2009) Studia Univ Babes Bolyai Chemia 54(1):175
60. Golgovici F, Cojocaru A, Nedelcu M., Visan T. (2010) J Electron Mater 39(9):2079
61. Golgovici F, Cojocaru A, Anicai L., Visan T. (2011) Mater Chem Phys 126:700
62. Abbott AP, Boothby D, Capper G., Davies DL, Rasheed R.K. (2004) J Am Chem Soc 126:9142
63. Chaouni H, Bessieres J, Modaressi A., Heizmann J.J. (2000) J Appl Electrochem 30(4):419