Electrochemical characterization of the underpotential deposition of tellurium on Au electrode

Electrochimica Acta

Volumn 52, Issue 11, 2007, Pages 3660-3666

  Zhu, W ^a   Yang, J Y ^a   Zhou, D X ^a   Bao, S Q ^a   Fan, X A ^a   Duan, X K ^a  

^a HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

Au; Cyclic voltammetry; Electrochemical atomic layer epitaxy; Tellurim; UPD

Indexed keywords

CONCENTRATION (PROCESS); CYCLIC VOLTAMMETRY; ELECTROCHEMISTRY; ELECTRODES; GOLD;

ELECTROCHEMICAL ATOMIC LAYER EPITAXY; ELECTROCHEMICAL CLEANING PROCEDURE; OPEN CIRCUIT CONDITIONS; UNDERPOTENTIAL DEPOSITION (UPD);

TELLURIUM;

EID: 33847057400     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2006.10.028     Document Type: Article

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