Characterization of film failures by bismuth electrodeposition-Application to thin deformed fluorocarbon films for stent applications

Electrochimica Acta

Volumn 55, Issue 3, 2010, Pages 1042-1050

  Holvoet, Servaas ^a   Horny, Paula ^a   Turgeon, Stephane ^a   Chevallier, Pascale ^a   Pireaux, Jean Jacques ^b   Mantovani, Diego ^a  

^a LAVAL UNIVERSITY   (Canada)

^b UNIVERSITY OF NAMUR   (Belgium)

Author keywords

Bismuth; Film cracking; Plasma deposited fluorocarbon coatings; Potentiostatic deposition; Surface analyses

Indexed keywords

ACIDIFIED ELECTROLYTES; BISMUTH FILM; CHAIN SCISSION; CHELATING AGENT; COATING FAILURES; COHESIVE PROPERTY; DEFLUORINATION; ELECTROCHEMICAL DEPOSITION; FILM CRACKING; FILM DEFECTS; FILM DEGRADATION; FLUOROCARBON COATINGS; FLUOROCARBON FILMS; FLUOROCARBON LAYERS; NEUTRAL CONDITIONS; NEW APPROACHES; POTENTIOSTATIC DEPOSITION; POTENTIOSTATIC ELECTRODEPOSITION; REDOX SIGNALS; SEM; STAINLESS STEEL SUBSTRATES; TOF-SIMS ANALYSIS; XPS;

BISMUTH; CHELATION; COATINGS; CRACKING (CHEMICAL); CYCLIC VOLTAMMETRY; ELECTRODEPOSITION; PLASMA DEPOSITION; REDUCTION; SECONDARY ION MASS SPECTROMETRY; STAINLESS STEEL; X RAY PHOTOELECTRON SPECTROSCOPY;

POLYMER BLENDS;

EID: 70749132425     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2009.09.079     Document Type: Article

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