Pulsed electrodeposition of bismuth telluride films: Influence of pulse parameters over nucleation and morphology

Electrochimica Acta

Volumn 52, Issue 9, 2007, Pages 3053-3060

  Richoux, V ^a   Diliberto, S ^a   Boulanger, C ^a   Lecuire, J M ^a  

^a INSTITUT JEAN LAMOUR   (France)

Author keywords

Bismuth telluride; Electrodeposition; Morphology; Nucleation; Pulse plating

Indexed keywords

BISMUTH COMPOUNDS; ELECTROPLATING; MORPHOLOGY; NUCLEATION; THIN FILMS;

BISMUTH TELLURIDE; GALVANOSTATIC ELECTROPLATING; NUCLEI DENSITIES; PULSE PLATING;

ELECTRODEPOSITION;

EID: 33846675264     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2006.09.042     Document Type: Article

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