Reactivity at the film/solution interface of ex situ prepared bismuth film electrodes: A scanning electrochemical microscopy (SECM) and atomic force microscopy (AFM) investigation

Electrochimica Acta

Volumn 53, Issue 2, 2007, Pages 555-560

  Hočevar, Samo B ^a   Daniele, Salvatore ^b   Bragato, Carlo ^b   Ogorevc, Božidar ^a  

^a NATIONAL INSTITUTE OF CHEMISTRY   (Slovenia)

^b CA' FOSCARI UNIVERSITY OF VENICE   (Italy)

Author keywords

AFM; Bismuth film electrode; Ex situ; NaBr; Reactivity; SECM

Indexed keywords

ATOMIC FORCE MICROSCOPY; BISMUTH; CRYSTAL GROWTH; ELECTRODES; REACTION KINETICS; THIN FILMS;

BISMUTH FILM ELECTRODES; GLASSY CARBON SUBSTRATE ELECTRODES; SCANNING ELECTROCHEMICAL MICROSCOPY (SECM);

INTERFACES (MATERIALS);

EID: 35048902381     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2007.07.035     Document Type: Article

References (23)

1. Wang J., Lu J., Hocevar S.B., Farias P.A.M., and Ogorevc B. Anal. Chem. 72 (2000) 3218
2. Wang J. Electroanalysis 17 (2005) 1341
3. Economou A. Trends Anal. Chem. 24 (2005) 334
4. Hutton E.A., Ogorevc B., Hocevar S.B., Weldon F., Smyth M.R., and Wang J. Electrochem. Commun. 3 (2001) 707
5. Baldo M.A., and Daniele S. Anal. Lett. 37 (2004) 995
6. Hutton E.A., Hocevar S.B., Ogorevc B., and Smyth M.R. Electrochem. Commun. 5 (2003) 765
7. Pauliukaite R., Hocevar S.B., Ogorevc B., and Wang J. Electroanalysis 16 (2004) 719
8. Hocevar S.B., Svancara I., Vytras K., and Ogorevc B. Electrochim. Acta 51 (2005) 706
9. Vytras K., Svancara I., and Metelka R. Electroanalysis 14 (2002) 19
10. Krolicka A., Bobrowski A., Kalcher K., Mocak J., Svancara I., and Vytras K. Electroanalysis 15 (2003) 1859
11. Królicka A., and Bobrowski A. Electrochem. Commun. 6 (2004) 99
12. Hutton E.A., Hocevar S.B., and Ogorevc B. Anal. Chim. Acta 537 (2005) 285
13. In: Bard A.J., and Mirkin M.V. (Eds). Scanning Electrochemical Microscopy (2001), Marcel Dekker Inc., New York, Basel
14. Mirkin M.V., Arca M., and Bard A.J. J. Phys. Chem. 97 (1993) 10790
15. Liljeroth P., Vanmaekelbergh D., Ruiz V., Konturri K., Jiang H., Kauppinen E., and Quinn B.M. J. Am. Chem. Soc. 126 (2004) 7126
16. Whitworth A.L., Mandler D., and Unwin P.R. Phys. Chem. Chem. Phys. 7 (2005) 356
17. Kwak J., and Bard A.J. Anal. Chem. 61 (1989) 1221
18. Wipf D.O., and Bard A.J. J. Electrochem. Soc. 138 (1991) 138
19. Sabatani E., and Rubinstein I. J. Phys. Chem. 91 (1987) 6663
20. Daniele S., Ugo P., Mazzocchin G.A., and Rudello D. In: Mackay R.A., and Texter J. (Eds). Electrochemistry in Colloids and Dispersions (1992), VCH, New York 55
21. Cline K.K., McDermott M.T., and McCreery R.L. J. Phys. Chem. 98 (1994) 5314
22. Baldo M.A., Daniele S., and Bragato C. J. Phys. IV France 107 (2003) 103
23. Svancara I., Baldrianova L., Vlcek M., Metelka R., and Vytras K. Electroanalysis 17 (2005) 120