Novel mixed method for the electrochemical deposition of thick layers of Bi2+xTe3-x with controlled stoichiometry

Electrochimica Acta

Volumn 54, Issue 2, 2008, Pages 755-762

  Glatz, Wulf ^a   Durrer, Lukas ^a   Schwyter, Etienne ^a   Hierold, Christofer ^a  

^a ETH ZURICH   (Switzerland)

Author keywords

Bismuth telluride; Electrochemical deposition; Microstructure; Thermoelectrics; Thick film

Indexed keywords

BISMUTH TELLURIDE; ELECTROCHEMICAL DEPOSITION; MICROSTRUCTURE; THERMOELECTRICS; THICK FILM;

REDUCTION;

EID: 53649108651     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2008.06.065     Document Type: Article

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