Investigation of the internal back reflectance of rear-side dielectric stacks for c-Si Solar Cells

IEEE Journal of Photovoltaics

Volumn 3, Issue 2, 2013, Pages 641-648

  Davis, Kristopher O ^a   Jiang, Kaiyun ^b   Demberger, Carsten ^b   Zunft, Heiko ^b   Haverkamp, Helge ^b   Habermann, Dirk ^b   Schoenfeld, Winston V ^a  

^a UNIVERSITY OF CENTRAL FLORIDA   (United States)

^b Gebr Schmid GmbH and Co   (Germany)

Author keywords

Characterization; dielectric films; metrology; optics; photovoltaic cells; Si photovoltaics (PV) modeling; silicon

Indexed keywords

ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION; BACK REFLECTANCE; CRYSTALLINE SILICON SOLAR CELLS; HIGH-VOLUME MANUFACTURING; PHOTOVOLTAICS; SPECTRAL REFLECTANCE CURVES; STACK CONFIGURATIONS; THIN DIELECTRIC FILM;

ATMOSPHERIC PRESSURE; CHARACTERIZATION; CHEMICAL VAPOR DEPOSITION; DIELECTRIC FILMS; INTERFACES (MATERIALS); MEASUREMENTS; OPTICS; PASSIVATION; PHOTOVOLTAIC CELLS; REFLECTION; SILICA; SILICON; SILICON NITRIDE; SILICON OXIDES; SILICON SOLAR CELLS; TITANIUM DIOXIDE;

SILICON WAFERS;

EID: 84875629553     PISSN: 21563381     EISSN: None     Source Type: Journal    
DOI: 10.1109/JPHOTOV.2012.2233861     Document Type: Article

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