19.4%-efficient large-area fully screen-printed silicon solar cells

Physica Status Solidi - Rapid Research Letters

Volumn 5, Issue 4, 2011, Pages 147-149

  Gatz, Sebastian ^a   Hannebauer, Helge ^a   Hesse, Rene ^a   Werner, Florian ^a   Schmidt, Arne ^a   Dullweber, Thorsten ^a   Schmidt, Jan ^a,b   Bothe, Karsten ^a   Brendel, Rolf ^a,b  

^a INSTITUTE FOR SOLAR ENERGY RESEARCH HAMELIN ISFH   (Germany)

^b LEIBNIZ UNIVERSITY HANNOVER   (Germany)

Author keywords

Photovoltaics; Silicon; Solar cells; Surface passivation

Indexed keywords

ALUMINUM PASTE; ATOMIC LAYER DEPOSITED; BACK SURFACE FIELDS; BELT-FURNACES; BEST VALUE; BORON-DOPED; CZOCHRALSKI SILICON WAFERS; IN-CELL; LARGE-AREA SOLAR CELLS; METAL CONTACTS; P-TYPE; PHOTOVOLTAICS; REAR SURFACES; SCREEN-PRINTED; SCREEN-PRINTED SOLAR CELLS; SURFACE PASSIVATION; SURFACE RECOMBINATION VELOCITIES;

ALUMINUM; ALUMINUM COATINGS; BORON; CONVERSION EFFICIENCY; DIELECTRIC MATERIALS; ENERGY CONVERSION; NITRIDES; PASSIVATION; PHOTOVOLTAIC EFFECTS; SEMICONDUCTING SILICON COMPOUNDS; SILICON SOLAR CELLS; SOLAR CELLS; SOLAR ENERGY;

SILICON WAFERS;

EID: 79954483661     PISSN: 18626254     EISSN: 18626270     Source Type: Journal    
DOI: 10.1002/pssr.201105045     Document Type: Letter

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