19%-efficient and 43 μm-thick crystalline Si solar cell from layer transfer using porous silicon

Progress in Photovoltaics: Research and Applications

Volumn 20, Issue 1, 2012, Pages 1-5

  Petermann, Jan Hendrik ^a   Zielke, Dimitri ^a   Schmidt, Jan ^a   Haase, Felix ^a   Rojas, Enrique Garralaga ^a   Brendel, Rolf ^a,b  

^a INSTITUTE FOR SOLAR ENERGY RESEARCH HAMELIN ISFH   (Germany)

^b LEIBNIZ UNIVERSITY HANNOVER   (Germany)

Author keywords

crystalline Si; free standing; kerf free; layer transfer; porous silicon; thin film

Indexed keywords

ALUMINUM OXIDES; APERTURE AREA; CRYSTALLINE SI; CRYSTALLINE SILICONS; EFFICIENCY IMPROVEMENT; FILL FACTOR; FREE STANDING; KERF-FREE; LAYER TRANSFER; POROUS SILICON LAYERS; SI WAFER; STATE OF THE ART; SURFACE PASSIVATION;

CRYSTALLINE MATERIALS; EFFICIENCY; OPEN CIRCUIT VOLTAGE; SEMICONDUCTING SILICON COMPOUNDS; SILICON; SILICON WAFERS; THIN FILMS;

POROUS SILICON;

EID: 84855323159     PISSN: 10627995     EISSN: 1099159X     Source Type: Journal    
DOI: 10.1002/pip.1129     Document Type: Article

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