Circular nanopatterns over large areas from the self-assembly of block copolymers guided by shallow trenches

ACS Nano

Volumn 5, Issue 4, 2011, Pages 2855-2860

  Hong, Sung Woo ^a   Gu, Xiaodan ^a   Huh, June ^b   Xiao, Shuaigang ^c   Russell, Thomas P ^a  

^a UNIVERSITY OF MASSACHUSETTS   (United States)

^b Yonsei University   (South Korea)

^c SEAGATE TECHNOLOGY   (United States)

Author keywords

areal density; block copolymer; circular patterns; solvent annealing; trench

Indexed keywords

AREAL DENSITIES; CIRCULAR PATTERN; CIRCULAR PATTERNS; CIRCULAR SHAPE; DATA STORAGE DEVICES; DIRECTED SELF-ASSEMBLY; FLAT FILMS; FLAT SUBSTRATES; HIGH DENSITY; MICRO-DOMAINS; NANO PATTERN; NANOLINES; PATTERNED SUBSTRATES; SOLVENT ANNEALING; TRENCH; ULTRADENSE;

ANNEALING; BLOCK COPOLYMERS; COPOLYMERIZATION; SELF ASSEMBLY; SOLVENTS; VIRTUAL STORAGE;

SUBSTRATES;

EID: 79955432145     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/nn103401w     Document Type: Article

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