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Volumn 46, Issue 12, 2013, Pages

Influence of phosphorous doping on silicon nanocrystal formation in silicon-rich silicon nitride films

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING CONDITION; CHEMICAL VAPOUR DEPOSITION; CRYSTALLIZATION BEHAVIOURS; CRYSTALLIZATION RATES; CRYSTALLIZATION TEMPERATURE; PHOSPHOROUS DOPING; PHOSPHORUS ADDITION; PHOSPHORUS CONCENTRATION; PHOSPHORUS CONTENTS; PHOSPHORUS-DOPED; POST ANNEALING; SILICON NANOCRYSTALS; SILICON NITRIDE MATRIX; SILICON-RICH SILICON NITRIDES;

EID: 84874508347     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/46/12/125104     Document Type: Article
Times cited : (13)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.