Optical in situ monitoring of solid phase crystallization of amorphous silicon

Journal of Crystal Growth

Volumn 165, Issue 3, 1996, Pages 341-344

  Bergmann, Ralf B ^a  

^a MAX PLANCK INSTITUT FÜR FESTKÖRPERFORSCHUNG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; AMORPHOUS FILMS; AMORPHOUS SILICON; CALCULATIONS; CHEMICAL VAPOR DEPOSITION; CRYSTAL GROWTH; LIGHT TRANSMISSION; MONITORING; NUCLEATION; OPTICAL PROPERTIES;

CRYSTALLINE NUCLEI; OPTICAL CONSTANTS; OPTICAL IN SITU MONITORING; RANDOM NUCLEATION; SOLID PHASE CRYSTALLIZATION;

CRYSTALLIZATION;

EID: 0030214356     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/0022-0248(96)00254-0     Document Type: Article

References (17)

1. J.H. Kim, J.Y. Lee and K.S. Nam, J. Appl. Phys. 77 (1995) 95.
2. S.-W. Lee, Y.-C. Jeon and S.-K. Joo, Appl. Phys. Lett. 66 (1995) 1671.
3. I.-Wei Wu, Solid State Phenom, 37/38 (1994) 553.
4. D.W. Greve, Microelectron. Eng. 25 (1994) 337.
5. J.H. Werner, R. Bergmann and R. Brendel, in: Festkörperprobleme/Advances in Solid State Physics, Vol. 34, Ed. R. Helbig (Vieweg, Braunschweig, 1994) pp. 115-146.
6. J.L. Batstone, Phil. Mag. A 67 (1993) 51.
7. T. Kretz, R. Stroh, P. Legagneux, O. Huet, M. Magis and D. Pribat, Solid State Phenom. 37/38 (1994) 311.
8. G.L. Olson and J.A. Roth, Mater. Sci. Rep. 3 (1988) 1.
9. R. Bergmann, G. Oswald, M. Albrecht and J.H. Werner, in: Polycrystalline Semiconductors IV - Physics, Chemistry and Technology, Eds. S. Pizzini, H.P. Strunk and J.H. Werner, Solid State Phenomena xxx (Trans. Tech. Publisher, Zug, Switzerland, 1995), in press.
10. C.H. Hong and C.Y. Park, H.-J. Kim, J. Appl. Phys. 71 (1992) 5427.
11. S. Hasegawa, S. Watanabe, T. Inokuma and Y. Kurata, J. Appl. Phys. 77 (1995) 1938.
12. J.W. Christian, in: Physical Metallurgy, 2nd ed., Ed. R.W. Cahn (North-Holland, Amsterdam, 1970) pp. 471-587.
13. M.K. Hatalis and D.W. Greve, J. Appl. Phys. 63 (1988) 2260.
14. T. Kobayashi, M. Koguchi, S. Iijima and M. Ohkura, J. Electrochem. Soc. 141 (1994) 1365.
15. G. Lubberts, B.C. Burkey, F. Moser and E.A. Trabka, J. Appl. Phys. 52 (1981) 6870.
16. P. Lautenschlager, M. Garriga, L. Vina and M. Cardona, Phys. Rev. B 36 (1987) 4821.
17. R.B. Iverson and R. Reif, J. Appl. Phys. 62 (1987) 1675.