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Volumn 8, Issue 1, 2011, Pages 205-208
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Introducing dopants by diffusion to improve the conductivity of silicon quantum dot materials in 3rd generation photovoltaic devices
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Author keywords
Conductivity; Diffusion; Doping; Quantum dot; Silicon
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Indexed keywords
ALTERNATIVE METHODS;
ANNEALING TIME;
BI-LAYER STRUCTURE;
CIRCULAR TRANSMISSION LINE;
CONDUCTIVITY;
DOPING;
HIGH-TEMPERATURE ANNEALING;
ORDER OF MAGNITUDE;
P-TYPE SI;
PHOSPHOROUS PENTOXIDE;
PHOTOVOLTAIC DEVICES;
QUANTUM DOT;
QUANTUM DOT MATERIALS;
QUARTZ SUBSTRATE;
SHEET RESISTIVITY;
SI CONCENTRATION;
SILICON DIOXIDE;
SILICON RICH OXIDES;
BORON;
DIFFUSION;
DOPING (ADDITIVES);
EXTRACTION;
MATERIALS;
PHOSPHORUS;
PHOTOVOLTAIC EFFECTS;
QUARTZ;
SEMICONDUCTOR QUANTUM DOTS;
SILICA;
SILICON COMPOUNDS;
SILICON OXIDES;
SILICON;
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EID: 78751481997
PISSN: 18626351
EISSN: 16101642
Source Type: Journal
DOI: 10.1002/pssc.201000677 Document Type: Article |
Times cited : (13)
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References (7)
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