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Volumn 8, Issue 1, 2011, Pages 205-208

Introducing dopants by diffusion to improve the conductivity of silicon quantum dot materials in 3rd generation photovoltaic devices

Author keywords

Conductivity; Diffusion; Doping; Quantum dot; Silicon

Indexed keywords

ALTERNATIVE METHODS; ANNEALING TIME; BI-LAYER STRUCTURE; CIRCULAR TRANSMISSION LINE; CONDUCTIVITY; DOPING; HIGH-TEMPERATURE ANNEALING; ORDER OF MAGNITUDE; P-TYPE SI; PHOSPHOROUS PENTOXIDE; PHOTOVOLTAIC DEVICES; QUANTUM DOT; QUANTUM DOT MATERIALS; QUARTZ SUBSTRATE; SHEET RESISTIVITY; SI CONCENTRATION; SILICON DIOXIDE; SILICON RICH OXIDES;

EID: 78751481997     PISSN: 18626351     EISSN: 16101642     Source Type: Journal    
DOI: 10.1002/pssc.201000677     Document Type: Article
Times cited : (13)

References (7)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.