Phase separation and Si nanocrystal formation in bulk SiO studied by x-ray scattering

Applied Physics Letters

Volumn 96, Issue 8, 2010, Pages

  Feroughi, O M ^a   Sternemann, C ^a   Sahle, Ch J ^a   Schroer, M A ^a   Sternemann, H ^a   Conrad, H ^a   Hohl, A ^b   Seidler, G T ^c   Bradley, J ^c   Fister, T T ^c,d   Balasubramanian, M ^d   Sakko, A ^e   Pirkkalainen, K ^e   Hamalainen K ^e   Tolan, M ^a  

^a TU DORTMUND UNIVERSITY   (Germany)

^b DARMSTADT UNIVERSITY OF TECHNOLOGY   (Germany)

^c UNIVERSITY OF WASHINGTON   (United States)

^d ARGONNE NATIONAL LABORATORY   (United States)

^e UNIVERSITY OF HELSINKI   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING TEMPERATURES; BULK AMORPHOUS; NATIVE STATE; ROUGH SURFACES; SI NANOCRYSTAL; SMALL ANGLE X-RAY SCATTERING; TEMPERATURE-INDUCED PHASE SEPARATION; X-RAY RAMAN SCATTERINGS;

AMORPHOUS SILICON; NANOCRYSTALS; PHASE INTERFACES; PHASE MODULATION; SCATTERING; SILICON COMPOUNDS; SILICON OXIDES; X RAY DIFFRACTION; X RAY SCATTERING;

PHASE SEPARATION;

EID: 77749239717     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3323106     Document Type: Article

References (22)

1. S. S. Iyer and Y. -H. Xie, Science SCIEAS 0036-8075 260, 40 (1993). 10.1126/science.260.5104.40
2. L. Pavesi, L. Dal Negro, C. Mazzoleni, G. Franzo, and F. Priolo, Nature (London) NATUAS 0028-0836 408, 440 (2000). 10.1038/35044012
3. V. Kapaklis, C. Politis, P. Poulopoulos, and P. Schweiss, Appl. Phys. Lett. APPLAB 0003-6951 87, 123114 (2005). 10.1063/1.2043246
4. M. Mamiya, H. Takei, M. Kikuchi, and C. Uyeda, J. Cryst. Growth JCRGAE 0022-0248 229, 457 (2001). 10.1016/S0022-0248(01)01202-7 (Pubitemid 32610434)
5. M. Zacharias, J. Heitmann, R. Scholz, U. Kahler, M. Schmidt, and J. Bläsing, Appl. Phys. Lett. APPLAB 0003-6951 80, 661 (2002). 10.1063/1.1433906 (Pubitemid 34148265)
6. A. Hohl, T. Wieder, P. A. van Aken, T. E. Weirich, G. Denninger, M. Vidal, S. Oswald, C. Deneke, J. Mayer, and H. Fuess, J. Non-Cryst. Solids JNCSBJ 0022-3093 320, 255 (2003). 10.1016/S0022-3093(03)00031-0
7. J. J. van Hapert, A. M. Vredenberg, E. E. van Faassen, N. Tomozeiu, W. M. Arnoldbik, and F. H. P. M. Habraken, Phys. Rev. B PRBMDO 0163-1829 69, 245202 (2004). 10.1103/PhysRevB.69.245202
8. W. M. Arnoldbik, N. Tomozeiu, E. D. van Hattum, R. W. Lof, A. M. Vredenberg, and F. H. P. M. Habraken, Phys. Rev. B PRBMDO 0163-1829 71, 125329 (2005). 10.1103/PhysRevB.71.125329 (Pubitemid 40777643)
9. A. Zimina, S. Eisebitt, W. Eberhardt, J. Heitmann, and M. Zacharias, Appl. Phys. Lett. APPLAB 0003-6951 88, 163103 (2006). 10.1063/1.2193810
10. See for an overview on XRS: W. Schülke, Electron Dynamics by Inelastic X-ray Scattering (Oxford University Press, New York, 2007);
11. C. Sternemann, H. Sternemann, S. Huotari, F. Lehmkühler, M. Tolan, and J. S. Tse, J. Anal. At. Spectrom. JASPE2 0267-9477 23, 807 (2008). 10.1039/b717441a
12. C. Sternemann, J. A. Soininen, M. Volmer, A. Hohl, G. Vankó, S. Streit, and M. Tolan, J. Phys. Chem. Solids JPCSAW 0022-3697 66, 2277 (2005). 10.1016/j.jpcs.2005.09.050
13. D. W. Schaefer, B. C. Bunker, and J. P. Wilcoxon, Proc. R. Soc. London, Ser. A PRLAAZ 0950-1207 423, 35 (1989). 10.1098/rspa.1989.0040
14. T. T. Fister, G. T. Seidler, L. Wharton, A. R. Battle, T. B. Ellis, J. O. Cross, A. T. Macrander, W. T. Elam, T. A. Tyson, and Q. Quian, Rev. Sci. Instrum. RSINAK 0034-6748 77, 063901 (2006). 10.1063/1.2204581 (Pubitemid 44000631)
15. H. Sternemann, C. Sternemann, G. T. Seidler, T. T. Fister, A. Sakko, and M. Tolan, J. Synchrotron Radiat. JSYRES 0909-0495 15, 162 (2008). 10.1107/S0909049508001696 (Pubitemid 351322336)
16. C. Krywka, C. Sternemann, M. Paulus, N. Javid, R. Winter, A. Al-Sawalmih, S. Yi, D. Raabe, and M. Tolan, J. Synchrotron Radiat. JSYRES 0909-0495 14, 244 (2007). 10.1107/S0909049507009727 (Pubitemid 46600673)
17. C. Tarrio and S. E. Schnatterly, J. Opt. Soc. Am. B JOBPDE 0740-3224 10, 952 (1993). 10.1364/JOSAB.10.000952
18. A. Sakko, C. Sternemann, Ch. J. Sahle, H. Sternemann, O. M. Feroughi, H. Conrad, F. Djurabekova, A. Hohl, G. T. Seidler, M. Tolan, and K. Hämäläinen (unpublished).
19. A. Schacht, C. Sternemann, A. Hohl, H. Sternemann, C. Sahle, M. Paulus, and M. Tolan, J. Non-Cryst. Solids JNCSBJ 0022-3093 355, 1285 (2009). 10.1016/j.jnoncrysol.2009.04.040
20. C. J. Sahle, C. Sternemann, H. Conrad, A. Herdt, O. M. Feroughi, M. Tolan, A. Hohl, R. Wagner, D. Lützenkirchen-Hecht, R. Frahm, A. Sakko, and K. Hämäläinen, Appl. Phys. Lett. APPLAB 0003-6951 95, 021910 (2009). 10.1063/1.3183581
21. V. M. Burlakov, G. A. D. Briggs, A. P. Sutton, A. Bongiorno, and A. Pasquarello, Phys. Rev. Lett. PRLTAO 0031-9007 93, 135501 (2004). 10.1103/PhysRevLett.93.135501
22. U. Vainio, K. Pirkkalainen, K. Kisko, G. Goerigk, N. E. Kotelnikova, and R. Serimaa, Eur. Phys. J. D EPJDF6 1434-6060 42, 93 (2007). 10.1140/epjd/e2007- 00015-y