Photoinduced disorder in strongly segregated block copolymer composite films for hierarchical pattern formation

ACS Nano

Volumn 7, Issue 2, 2013, Pages 1513-1523

  Yao, Li ^a   Watkins, James J ^a  

^a UNIVERSITY OF MASSACHUSETTS   (United States)

Author keywords

block copolymer; enantiopure tartaric acid additive; hierarchical pattern formation; phase separation; photoinduced disordering transition

Indexed keywords

DEPROTECTION; DISORDERED DOMAINS; DOMAIN SIZE; ENANTIOPURE; FILM MORPHOLOGY; HIERARCHICAL PATTERNS; MIXED MATERIALS; PHOTO-INDUCED; PHOTOACID GENERATORS; POLY(ACRYLIC ACID ); SEGREGATION STRENGTH; SUB-MICROMETER PATTERNS; TARTARIC ACIDS; TRIFLATES;

CARBOXYLIC ACIDS; COMPOSITE FILMS; PHASE SEPARATION; PHOTOLITHOGRAPHY;

BLOCK COPOLYMERS;

EID: 84874412882     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/nn3052956     Document Type: Article

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