An atomic layer deposition reactor with dose quantification for precursor adsorption and reactivity studies

Review of Scientific Instruments

Volumn 84, Issue 1, 2013, Pages

  Larrabee, T J ^a   Mallouk, T E ^a   Allara, D L ^a  

^a PENNSYLVANIA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COATED SUBSTRATES; CONTROLLED TEMPERATURE; DOSE CONTROL; GAS COMPOSITIONS; GROWTH CONTROL; MASS MEASUREMENTS; MOLECULAR FLOW; PNEUMATIC VALVE; PRECURSOR ADSORPTION; QUADRUPOLE MASS SPECTROMETER; REACTANT EXPOSURES; REACTION CHAMBERS; REACTIVITY STUDIES; SITU QUARTZ CRYSTAL MICROBALANCE; STICKING COEFFICIENTS; SURFACE AREA;

ATOMIC LAYER DEPOSITION; FILM GROWTH;

ADSORPTION;

EID: 84874056941     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4774042     Document Type: Article

References (38)

1. S. M. George, Chem. Rev. 110 (1), 111 (2010). 10.1021/cr900056b
2. R. L. Puurunen, J. Appl. Phys. 97 (12), 121301 (2005). 10.1063/1.1940727
3. M. Leskela and M. Ritala, Thin Solid Films 409 (1), 138 (2002). 10.1016/S0040-6090(02)00117-7
4. T. Aaltonen, A. Rahtu, M. Ritala, and M. Leskela, Electrochem. Solid-State Lett. 6 (9), C130 (2003). 10.1149/1.1595312
5. T. Suntola, A. J. Pakkala, and S. G. Lindors, U.S. patent 4,389,973 (28 June 1983)
6. T. Suntola, Thin Solid Films 216 (1), 84 (1992). 10.1016/0040-6090(92) 90874-B
7. B. Sang and M. Konagai, Japn. J. Appl. Phys. 35 (5B), L602 (1996). 10.1143/JJAP.35.L602
8. J. W. Elam, M. D. Groner, and S. M. George, Rev. Sci. Instrum. 73 (8), 2981 (2002). 10.1063/1.1490410
9. D. M. Hausmann, E. Kim, J. Becker, and R. G. Gordon, Chem. Mater. 14 (10), 4350 (2002). 10.1021/cm020357x
10. J. S. Becker, E. Kim, and R. G. Gordon, Chem. Mater. 16 (18), 3497 (2004). 10.1021/cm049516y
11. R. A. Wind and S. M. George, J. Phys. Chem. A 114 (3), 1281 (2010). 10.1021/jp9049268
12. S. T. Christensen, J. W. Elam, F. A. Rabuffetti, Q. Ma, S. J. Weigand, B. Lee, S. Seifert, P. C. Stair, K. R. Poeppelmeier, M. C. Hersam, and M. J. Bedzyk, Small 5 (6), 750 (2009). 10.1002/smll.200801920
13. J. Lu, B. Fu, M. C. Kung, G. Xiao, J. W. Elam, H. H. Kung, and P. C. Stair, Science 335 (6073), 1205 (2012). 10.1126/science.1212906
14. J. W. Elam, Z. A. Sechrist, and S. M. George, Thin Solid Films 414 (1), 43 (2002). 10.1016/S0040-6090(02)00427-3
15. H. Isshiki, Y. Aoyagi, T. Sugano, S. Iwai, and T. Meguro, Appl. Surf. Sci. 82-83, 57 (1994). 10.1016/0169-4332(94)90195-3
16. T. S. Christensen, J. W. Elam, B. Lee, Z. Feng, M. J. Bedzyk, and M. C. Hersam, Chem. Mater. 21 (3), 516 (2009). 10.1021/cm8026863
17. M. N. Rocklein and S. M. George, Anal. Chem. 75 (19), 4975 (2003). 10.1021/ac030141u
18. J. W. Elam and M. J. Pellin, Anal. Chem. 77 (11), 3531 (2005). 10.1021/ac050349a
19. D. R. Burgess Jr., J. E. Maslar, W. S. Hurst, E. F. Moore, W. A. Kimes, R. R. Fink, and N. V. Nguyen, AIP Conf. Proc. 788 (1), 141 (2005). 10.1063/1.2062952
20. G. Sauerbrey, Z. Phys. A: Hadrons Nucl. 155 (2), 206 (1959). 10.1007/BF01337937
21. A. Arnau, Sensors 8 (1), 370 (2008). 10.3390/s8010370
22. J. W. Bender and J. Krim, in Microscale Diagnostic Techniques, edited by, K. S. Breuer, (Springer, Berlin, 2005), p. 227
23. L. Donald Smith, Thin-Film Deposition: Principles and Practice (McGraw-Hill, New York, 1995), p. 21
24. F. W. Sears and G. L. Salinger, Thermodynamics, Kinetic Theory, and Statistical Thermodynamics, 3d ed. (Addison-Wesley, Reading, MA, 1975), pp. 254-258
25. E. Wiberg, N. Wiberg, and A. F. Holleman, Inorganic Chemistry, 1st ed. (Academic, De Gruyter, San Diego, Berlin; New York, 2001), p. 1024
26. P. N. Dasgupta, O. Trejo, and F. B. Prinz, J. Vac. Sci. Technol. A 30 (1), 01A110 (2012). 10.1116/1.3656945
27. J. E. Maslar, W. S. Hurst, D. R. Burgess, W. Kimes, N. V. Nguyen, E. F. Moore, and J. T. Hodges, ECS Trans. 13 (2), 139 (2008). 10.1149/1.2908626
28. B. A. Sperling, W. A. Kimes, J. E. Maslar, and P. M. Chu, J. Vac. Sci. Technol. A 28 (4), 613 (2010). 10.1116/1.3455187
29. J. E. Maslar, W. Kimes, and B. Sperling, ECS Trans. 41 (2), 157 (2011). 10.1149/1.3633664
30. M. Ritala, M. Juppo, K. Kukli, A. Rahtu, and M. Leskela, J. Phys. IV France 9 (Pr8), 1021 (1999). 10.1051/jp4:19998127
31. M. Juppo, A. Rahtu, M. Ritala, and M. Leskela, Langmuir 16 (8), 4034 (2000). 10.1021/la991183+
32. I. J. Hsu, D. A. Hansgen, B. E. McCandless, B. G. Willis, and J. G. Chen, J. Phys. Chem. C 115 (9), 3709 (2011). 10.1021/jp111180e
33. L. A. Belfiore, Transport Phenomena for Chemical Reactor Design (Wiley, New York, 2003)
34. Jurgen H. Gross, Mass Spectrometry: A Textbook, 2nd ed. (Springer, Berlin, 2010)
35. D. L. Allara and R. G. Nuzzo, Langmuir 1 (1), 45 (1985). 10.1021/la00061a007
36. D. L. Allara and R. G. Nuzzo, Langmuir 1 (1), 52 (1985). 10.1021/la00061a008
37. T. B. Tighe, T. A. Daniel, Z. Zhu, S. Uppili, N. Winograd, and D. L. Allara, J. Phys. Chem. B 109 (44), 21006 (2005). 10.1021/jp054174k
38. A. V. Walker, T. B. Tighe, O. Cabarcos, B. C. Haynie, D. L. Allara, and N. Winograd, J. Phys. Chem. C 111 (2), 765 (2007). 10.1021/jp064372r