Time-resolved Fourier transform infrared spectroscopy of the gas phase during atomic layer deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 28, Issue 4, 2010, Pages 613-621

  Sperling, Brent A ^a   Kimes, William A ^a   Maslar, James E ^a   Chu, Pamela M ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION PROCESS; GASPHASE; MASS TRANSPORT; MOLECULAR NUMBER DENSITY; MOVING MIRRORS; PRECURSOR INJECTION; SIGNAL AVERAGE; TETRAKIS(ETHYLMETHYLAMIDO)HAFNIUM; TIME RESOLUTION; TIME-RESOLVED FOURIER TRANSFORM INFRARED SPECTROSCOPIES;

ATOMIC LAYER DEPOSITION; ATOMIC SPECTROSCOPY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HAFNIUM; HAFNIUM OXIDES; SURFACE REACTIONS; TRANSIENT ANALYSIS; WATER VAPOR; WAVELET TRANSFORMS;

FOURIER TRANSFORMS;

EID: 77954183832     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3455187     Document Type: Conference Paper

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