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Volumn 3, Issue 1, 2013, Pages 114-118

Impurity-related limitations of next-generation industrial silicon solar cells

Author keywords

Charge carrier lifetime; impurities; photovoltaic cells; semiconductor device modeling; silicon

Indexed keywords

BORON-OXYGEN; CELL EFFICIENCY; DEVICE SIMULATIONS; ELEVATED TEMPERATURE; METALLIC IMPURITY; N TYPE SILICON; RECOMBINATION CENTERS; SILICON MATERIALS;

EID: 84871726057     PISSN: 21563381     EISSN: None     Source Type: Journal    
DOI: 10.1109/JPHOTOV.2012.2210030     Document Type: Article
Times cited : (99)

References (28)
  • 2
    • 1442337113 scopus 로고    scopus 로고
    • Structure and transformation of the metastable boron-and oxygen-related defect center in crystalline silidon
    • J. Schmidt and K. Bothe, "Structure and transformation of the metastable boron-and oxygen-related defect center in crystalline silidon," Phys. Rev. B, vol. 69, pp. 024107-1-024107-8, 2004.
    • (2004) Phys. Rev. B , vol.69 , pp. 0241071-0241078
    • Schmidt, J.1    Bothe, K.2
  • 3
    • 0015973475 scopus 로고
    • Investigation of photon and thermal induced changes in silicon solar cells
    • H. Fischer and W. Pschunder, "Investigation of photon and thermal induced changes in silicon solar cells," in Proc. 10th IEEE Photovolt. Spec. Conf., 1973, pp. 404-411.
    • (1973) Proc. 10th IEEE Photovolt. Spec. Conf. , pp. 404-411
    • Fischer, H.1    Pschunder, W.2
  • 4
    • 41049105821 scopus 로고    scopus 로고
    • Investigations on the long time behavior of the metastable boron-oxygen complex in crystalline silicon
    • DOI 10.1002/pip.779
    • A. Herguth, G. Schubert, M. Kaes, and G. Hahn, "Investigations on the long time behavior of the metastable boron-oxygen complex in crystalline silicon," Prog. Photovoltaics: Res. Appl., vol. 16, pp. 135-140, 2008. (Pubitemid 351651309)
    • (2008) Progress in Photovoltaics: Research and Applications , vol.16 , Issue.2 , pp. 135-140
    • Herguth, A.1    Schubert, G.2    Kaes, M.3    Hahn, G.4
  • 5
    • 54949141878 scopus 로고    scopus 로고
    • Deactivation of the boron-oxygen recombination center in silicon by illumination at elevated temperature
    • B. Lim, K. Bothe, and J. Schmidt, "Deactivation of the boron-oxygen recombination center in silicon by illumination at elevated temperature," Physica Status Solidi-Rapid Res. Lett., vol. 2, pp. 93-95, 2008.
    • (2008) Physica Status Solidi-Rapid Res. Lett , vol.2 , pp. 93-95
    • Lim, B.1    Bothe, K.2    Schmidt, J.3
  • 9
    • 80052096838 scopus 로고    scopus 로고
    • Comparison of the thermal stability of single Al2O3 layers and Al2O3/SiNx stacks for the surface passivation of silicon
    • B. Veith, F. Werner, D. Zielke, R. Brendel, and J. Schmidt, "Comparison of the thermal stability of single Al2O3 layers and Al2O3/SiNx stacks for the surface passivation of silicon," Energy Procedia, vol. 8, pp. 307-312, 2011.
    • (2011) Energy Procedia , vol.8 , pp. 307-312
    • Veith, B.1    Werner, F.2    Zielke, D.3    Brendel, R.4    Schmidt, J.5
  • 11
    • 80755153221 scopus 로고    scopus 로고
    • Models for numerical device simulations of crystalline silicon solar cells: A review
    • P. P. Altermatt, "Models for numerical device simulations of crystalline silicon solar cells: A review," J. Comput. Electron., vol. 10, pp. 314-330, 2011.
    • (2011) J. Comput. Electron , vol.10 , pp. 314-330
    • Altermatt, P.P.1
  • 12
    • 20444401538 scopus 로고    scopus 로고
    • Fundamental boron-oxygen-related carrier lifetime limit in mono-and multicrystalline silicon
    • K. Bothe, R. Sinton, and J. Schmidt, "Fundamental boron-oxygen-related carrier lifetime limit in mono-and multicrystalline silicon," Prog. Photovoltaics: Res. Appl., vol. 15, pp. 287-296, 2005.
    • (2005) Prog. Photovoltaics: Res. Appl , vol.15 , pp. 287-296
    • Bothe, K.1    Sinton, R.2    Schmidt, J.3
  • 18
    • 0037475006 scopus 로고    scopus 로고
    • Temperature-and injection-dependent lifetime spectroscopy for the characterization of defect centers in semiconductors
    • J. Schmidt, "Temperature-and injection-dependent lifetime spectroscopy for the characterization of defect centers in semiconductors," Appl. Phys. Lett., vol. 82, pp. 2178-2180, 2003.
    • (2003) Appl. Phys. Lett , vol.82 , pp. 2178-2180
    • Schmidt, J.1
  • 21
    • 42149093175 scopus 로고    scopus 로고
    • Imaging interstitial iron concentrations in boron-doped crystalline silicon using photoluminescence
    • D. Macdonald, J. Tan, and T. Trupke, "Imaging interstitial iron concentrations in boron-doped crystalline silicon using photoluminescence," J. Appl. Phys., vol. 103, pp. 073710-1-073710-7, 2008.
    • (2008) J. Appl. Phys , vol.103 , pp. 0737101-0737107
    • MacDonald, D.1    Tan, J.2    Trupke, T.3
  • 22
    • 21044458762 scopus 로고    scopus 로고
    • Electronic properties of iron-boron pairs in crystalline silicon by temperature-and injection-level dependent lifetime measurements
    • J. E. Birkholz, K. Bothe, D. Macdonald, and J. Schmidt, "Electronic properties of iron-boron pairs in crystalline silicon by temperature-and injection-level dependent lifetime measurements," J. Appl. Phys., vol. 97, pp. 103708-1-103708-6, 2005.
    • (2005) J. Appl. Phys , vol.97 , pp. 1037081-1037086
    • Birkholz, J.E.1    Bothe, K.2    MacDonald, D.3    Schmidt, J.4
  • 23
    • 33749489361 scopus 로고    scopus 로고
    • Doping dependence of the carrier lifetime crossover point upon dissociation of iron-boron pairs in crystalline silicon
    • D. Macdonald, T. Roth, P. N. K. Deenapanray, T. Trupke, and R. A. Bardos, "Doping dependence of the carrier lifetime crossover point upon dissociation of iron-boron pairs in crystalline silicon," Appl. Phys. Lett., vol. 89, pp. 142107-1-142107-3, 2006.
    • (2006) Appl. Phys. Lett , vol.89 , pp. 1421071-1421073
    • MacDonald, D.1    Roth, T.2    Deenapanray, P.N.K.3    Trupke, T.4    Bardos, R.A.5
  • 24
    • 37549058378 scopus 로고    scopus 로고
    • Recombination activity of interstitial chromium and chromium-boron pairs in silicon
    • J. Schmidt, R. Krain, K. Bothe, G. Pensl, and S. Beljakowa, "Recombination activity of interstitial chromium and chromium-boron pairs in silicon," J. Appl. Phys., vol. 102, pp. 123701-1-123701-10, 2007.
    • (2007) J. Appl. Phys , vol.102 , pp. 1237011-12370110
    • Schmidt, J.1    Krain, R.2    Bothe, K.3    Pensl, G.4    Beljakowa, S.5
  • 25
    • 77955897613 scopus 로고    scopus 로고
    • Imaging of chromium point defects in p-type silicon
    • H. Habenicht, M. C. Schubert, and W. Warta, "Imaging of chromium point defects in p-type silicon," J. Appl. Phys., vol. 108, pp. 034909-1-034909-7, 2010.
    • (2010) J. Appl. Phys , vol.108 , pp. 0349091-0349097
    • Habenicht, H.1    Schubert, M.C.2    Warta, W.3
  • 27
    • 33847153905 scopus 로고    scopus 로고
    • Cobalt related defect levels in silicon analyzed by temperature-and injection-dependent lifetime spectroscopy
    • S. Diez, S. Rein, T. Roth, and S. W. Glunz, "Cobalt related defect levels in silicon analyzed by temperature-and injection-dependent lifetime spectroscopy," J. Appl. Phys., vol. 101, pp. 033710-1-033710-6, 2007.
    • (2007) J. Appl. Phys , vol.101 , pp. 0337101-0337106
    • Diez, S.1    Rein, S.2    Roth, T.3    Glunz, S.W.4
  • 28
    • 10044269932 scopus 로고    scopus 로고
    • Recombination activity of interstitial iron and other transition metal point defects in p-and n-type crystalline silicon
    • D. Macdonald and L. J. Geerligs, "Recombination activity of interstitial iron and other transition metal point defects in p-and n-type crystalline silicon," Appl. Phys. Lett., vol. 85, pp. 4061-4063, 2004.
    • (2004) Appl. Phys. Lett , vol.85 , pp. 4061-4063
    • MacDonald, D.1    Geerligs, L.J.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.