Rear-surface passivation technology for crystalline silicon solar cells: A versatile process for mass production

Conference Record of the IEEE Photovoltaic Specialists Conference

Volumn , Issue PART 2, 2012, Pages

  Gassenbauer, Y ^a   Ramspeck, K ^a   Bethmann, B ^a   Dressler, K ^a   Moschner, J D ^a   Fiedler, M ^a   Brouwer, E ^a   Droßler R ^a   Lenck, N ^a   Heyer, F ^a   Feldhaus, M ^a   Seidl, A ^b   Muller M ^b   Metz, A ^a  

^a SCHOTT Solar AG   (Germany)

^b Schott Solar Wafer GmbH   (Germany)

Author keywords

Dielectric films; manufacturing processes; photovoltaic cells; silicon

Indexed keywords

COST EFFECTIVENESS; DIELECTRIC FILMS; EFFICIENCY; PASSIVATION; PHOTOELECTROCHEMICAL CELLS; PHOTOVOLTAIC CELLS; SILICON; SILICON WAFERS;

BACK SURFACE FIELDS; CRYSTALLINE SILICON SOLAR CELLS; DIELECTRIC PASSIVATION; ECONOMIC EFFICIENCY; HIGH-PERFORMANCE CELL; MANUFACTURING PROCESS; MONOCRYSTALLINE MATERIALS; SURFACE PASSIVATION;

SILICON SOLAR CELLS;

EID: 84891320120     PISSN: 01608371     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/pvsc-vol2.2012.6656762     Document Type: Conference Paper

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