Fabrication of an ultralow-resistance ohmic contact to MWCNT-metal interconnect using graphitic carbon by electron beam-induced deposition (EBID)

IEEE Transactions on Nanotechnology

Volumn 11, Issue 6, 2012, Pages 1223-1230

  Kim, Songkil ^a   Kulkarni, Dhaval D ^b   Rykaczewski, Konrad ^c   Henry, Mathias ^a   Tsukruk, Vladimir V ^b   Fedorov, Andrei G ^a  

^a GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

^b Georgia Institute of Technology   (United States)

^c Massachusetts Institute of Technology Cambridge   (United States)

Author keywords

Contact resistances; electron beam induced deposition (EBID); multiwalled carbon nanotube (MWCNT); MWCNT metal interconnect

Indexed keywords

CONTACT INTERFACE; CONTACT LENGTH; ELECTRICAL AND STRUCTURAL PROPERTIES; ELECTRON BEAM-INDUCED DEPOSITION; FABRICATION PROCESS; GRAPHITIC CARBONS; INTERCONNECT TECHNOLOGY; LOW TEMPERATURES; METAL INTERCONNECTS; MWCNT-METAL INTERCONNECT; NANO-DEVICES; POST-DEPOSITION; PROCESS SIMULATIONS; SCALING RELATIONSHIPS; THERMAL-ANNEALING;

CARBON; CONTACT RESISTANCE; ELECTRIC CONTACTORS; ELECTRIC PROPERTIES; ELECTRON BEAMS; MULTIWALLED CARBON NANOTUBES (MWCN); OHMIC CONTACTS; SHELLS (STRUCTURES);

AUTOMOBILE MANUFACTURE;

EID: 84870267923     PISSN: 1536125X     EISSN: None     Source Type: Journal    
DOI: 10.1109/TNANO.2012.2220377     Document Type: Article

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