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Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 2, 2001, Pages 429-434

Frequency-dependent pulsed direct current magnetron sputtering of titanium oxide films

(4) Kim, J Y a Barnat, E a Rymaszewski, E J a Lu, T M a

a RENSSELAER POLYTECHNIC INSTITUTE (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT DENSITY; DIELECTRIC FILMS; ELECTRIC FIELD MEASUREMENT; LEAKAGE CURRENTS; MAGNETRON SPUTTERING; OXYGEN; PERMITTIVITY; PLASMA SOURCES; PRESSURE EFFECTS; SPUTTER DEPOSITION;

ELECTRIC FIELD STRENGTH;

TITANIUM DIOXIDE;

EID: 0035271836 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.1351064 Document Type: Article

Times cited : (11)

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