SCOPUS 정보 검색 플랫폼

Vacuum

Volumn 89, Issue 1, 2013, Pages 261-266

Effects of Ar gas pressure on microstructure of DLC films deposited by high-power pulsed magnetron sputtering

(5) Nakao, Setsuo a Yukimura, Ken b Ogiso, Hisato b Nakano, Shizuka b Sonoda, Tsutomu a

a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST (Japan)

b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST (Japan)

Author keywords

Ar gas pressure; Diamond like films; High power pulsed magnetron sputtering; Raman spectroscopy

Indexed keywords

AR GAS PRESSURE; CLUSTER SIZES; COMPOSITIONAL ANALYSIS; DIAMOND-LIKE FILM; DLC FILM; ELASTIC RECOIL DETECTION ANALYSIS; GAUSSIAN FUNCTIONS; INTENSITY RATIO; ION BEAM ANALYSIS; PEAK FITTING; PEAK POSITION; PULSED MAGNETRON SPUTTERING; RUTHERFORD BACKSCATTERING SPECTROMETRY; SI SUBSTRATES;

ARGON; CARBON FILMS; FULL WIDTH AT HALF MAXIMUM; GASES; HIGH PRESSURE EFFECTS; MAGNETRON SPUTTERING; MICROSTRUCTURE; RAMAN SPECTROSCOPY; RUTHERFORD BACKSCATTERING SPECTROSCOPY;

DIAMOND LIKE CARBON FILMS;

EID: 84869085879 PISSN: 0042207X EISSN: None Source Type: Journal
DOI: 10.1016/j.vacuum.2012.07.004 Document Type: Conference Paper

Times cited : (46)

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