Dynamic MC simulation for a-C:H deposition in methane plasma based on subplantation model

Diamond and Related Materials

Volumn 12, Issue 3-7, 2003, Pages 927-930

  Miyagawa, Y ^a   Nakadate, H ^b   Ikeyama, M ^a   Nakao, S ^a   Miyagawa, S ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b PEGASUS Software Inc   (Japan)

Author keywords

A C:H; Amorphous hydrogenated carbon; Diamond like carbon; Dynamic Monte Carlo simulation; Ion assisted deposition

Indexed keywords

COMPUTER SIMULATION; METHANE; MONOLAYERS; MONTE CARLO METHODS; SURFACE REACTIONS;

METHANE PLASMA;

THIN FILMS;

DIAMOND;

EID: 0038184013     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(02)00223-6     Document Type: Article

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