High-power pulsed magnetron sputtering glow plasma in argon gas and pulsed ion extraction

IEEE Transactions on Plasma Science

Volumn 38, Issue 11 PART 1, 2010, Pages 3016-3027

  Jing, Fengjuan ^a   Yukimura, Ken ^a,b,c   Hara, Shiro ^b   Nakano, Shizuka ^b   Ogiso, Hisato ^b   Huang, Nan ^a  

^a SOUTHWEST JIAOTONG UNIVERSITY   (China)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^c HARBIN INSTITUTE OF TECHNOLOGY   (China)

Author keywords

Glow discharge; high power impulse magnetron sputtering; high power pulsed magnetron sputtering (HPPMS); high power pulsed sputtering; magnetron sputtering; plasma density; pulsed discharge

Indexed keywords

ARGON GAS; ARGON ION; CALCULATED VALUES; CIRCUIT INDUCTANCE; CONNECTING WIRES; CURRENT CHANGE; CURRENT CHARACTERISTIC; CURRENT-LIMITING RESISTORS; ELECTRICAL CHARACTERISTIC; EXPERIMENTAL CONDITIONS; GLOW PLASMAS; HIGH-POWER; INITIAL STAGES; ION CURRENTS; ION DENSITY; ION EXTRACTION; IONIZED STATE; MATCHING CONDITION; MAXIMUM POWER; METAL PLASMA SOURCE; METAL SPECIES; OPTICAL CHARACTERISTICS; OPTICAL EMISSION SPECTRA; PEAK CURRENTS; PLASMA BASED ION IMPLANTATION AND DEPOSITION; PLASMA IMPEDANCE; PULSED DISCHARGE; PULSED MAGNETRON SPUTTERING; PULSED POWER SOURCES; SERIES CONNECTIONS; STATIONARY STATE; SUBSTRATE HOLDERS; VOLTAGE APPLICATIONS; VOLTAGE SOURCE; WAVE FORMS;

ARGON; EMISSION SPECTROSCOPY; FILM PREPARATION; GLOW DISCHARGES; ION IMPLANTATION; IONIZATION OF GASES; MAGNETRON SPUTTERING; PLASMA DENSITY; PLASMA DEPOSITION; PLASMA JETS; PLASMAS; PULSE GENERATORS; TITANIUM;

CURRENT VOLTAGE CHARACTERISTICS;

EID: 78349312048     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2010.2066581     Document Type: Conference Paper

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