Microstructure-dependent conformal atomic layer deposition on 3D nanotopography

Langmuir

Volumn 28, Issue 45, 2012, Pages 15809-15815

  Li, Qianqian ^a   Dong, Cezhou ^a   Nie, Anmin ^a   Liu, Jiabin ^a   Zhou, Wu ^a   Wang, Hongtao ^a  

^a ZHEJIANG UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS PHASE; BROAD-BAND PHOTOLUMINESCENCE; COMPARISON STUDY; CONFORMAL FILMS; CONFORMAL GROWTH; CONFORMALITY; KINETIC FACTORS; MORPHOLOGY EVOLUTION; NANOTOPOGRAPHIES; POLYCRYSTALLINE; SELF-LIMITED GROWTH; SINGLE-CRYSTAL FILMS; STRONG CORRELATION; STRUCTURAL CHARACTERIZATION; SURFACE ELECTRONIC STATE; TIO;

AMORPHOUS FILMS; AMORPHOUS MATERIALS; MICROSTRUCTURE; NANOTECHNOLOGY; NANOWIRES; SURFACE MORPHOLOGY; SURFACE REACTIONS; SURFACE RECONSTRUCTION; THREE DIMENSIONAL COMPUTER GRAPHICS; TITANIUM DIOXIDE;

ATOMIC LAYER DEPOSITION;

EID: 84869075139     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la302391u     Document Type: Article

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