Phase transition in sputtered HfO 2 thin films: A qualitative Raman study

Applied Surface Science

Volumn 261, Issue , 2012, Pages 727-729

  Belo, G S ^a   Nakagomi, F ^b   Minko, A ^a   Da Silva, S W ^b   Morais, P C ^b   Buchanan, D A ^a  

^a UNIVERSITY OF MANITOBA   (Canada)

^b UNIVERSITY OF BRASILIA   (Brazil)

Author keywords

Dielectrics; Hafnium dioxide; High ; Raman scattering; Sputtering

Indexed keywords

AMORPHOUS FILMS; CRYSTALLITE SIZE; DEPOSITION; DIELECTRIC MATERIALS; HAFNIUM OXIDES; RAMAN SCATTERING; SPUTTERING;

CRYSTALLITE SIZE EFFECTS; DEPOSITION CONDITIONS; HAFNIUM DIOXIDE; LINEAR RAMAN SPECTROSCOPIES; MONOCLINIC PHASE; POST DEPOSITION ANNEALING; RAMAN STUDIES; TETRAGONAL PHASE;

THIN FILMS;

EID: 84867741205     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2012.08.088     Document Type: Article

References (27)

1. M.L. Green, E.P. Gusev, R. Degraeve, and E. Garfunkel Journal of Applied Physics (Review) 90 2001 2057
2. 2 and Related Dielectrics: Science and Technology 2000 Kluwer Dordrecht pp. 557
3. E.P. Gusev, M. Copel, E. Cartier, D.A. Buchanan, H. Okorn-Schmidt, M. Gribelyuk, D. Falcon, R. Murphy, S. Molis, I.J.R. Baumvol, C. Krug, M. Jussila, M. Tuominen, and S. Haukka H.Z. Massoud, E.H. Poindexter, M. Hirose, I.J.R. Baumvol, Physical Characterization of Ultrathin Films of High Dielectric Constant Materials on Silicon 2000 Pennington New Jersey 477
4. D.A. Buchanan, and S.H. Lo Microelectronic Engineering 36 1997 13
5. 2 -based Dielectrics for Future CMOS Applications 1996 Pennington New Jersey 3
6. D.A. Buchanan Scaling the Gate Dielectric: Integration of High-k Gate Dielectrics CMOS Applications 11th Canadian Semiconductor Technology Conference Ottawa, Ontario 2003
7. E. Wu, S.-H. Lo, W. Abadeer, A. Acovic, D.A. Buchanan, T. Furukawa, D. Brochu, and R. Dufresne, Determination of ultra-thin oxide voltages and thickness and the impact on reliability projection, 35th Annual IEEE International Reliability Physics Symposium, Piscataway, NJ, 1997.
8. D.A. Buchanan Physica Status Solidi 1 2005 S155
9. G.D. Wilk, R.M. Wallace, and J.M. Anthony Journal of Applied Physics 89 2001 5243
10. G.D. Wilk, R.M. Wallace, and J.M. Anthony Journal of Applied Physics 87 2000 484
11. G.D. Wilk, and R.M. Wallace Applied Physics Letters 74 1999 2854
12. J. Robertson Journal of Vacuum Science and Technology B 18 2000 1785
13. D.A. Buchanan IBM Journal of Research and Development 43 1999 245
14. M. Yang, E.P. Gusev, M. Ieong, O. Gluschenkov, D.C. Boyd, K.C. Chan, P.M. Kozlowski, C.P. D'Emic, R.M. Sicina, P.C. Jamison, and A.I. Chou IEEE Electron Device Letters 24 2003 339
15. E.P. Gusev, D.A. Buchanan, E. Cartier, A. KUmar, D. DiMaria, S. Guha, A. Callegari, S. Zafar, P.C. Jamison, D.A. Neumayer, M. Copel, M.A. Gribelyuk, H. Okorn-Schmidt, C. D'Emic, P. Kozlowski, K. Chan, N. Bojarczuk, L.A. Ragnarsson, P. Ronsheim, K. Rim, R.J. Fleming, A. Mocuta, and A. Ajmera Electron Devices Meeting 2001 20.1.1
16. M. Houssa High-κ Gate Dielectrics (Materials Science and Engineering) 2003 Institute of Physics (IOP) Bristol
17. J. Robertson Reports on Progress in Physics 69 2006 327
18. J. Robertson European Physical Journal: Applied Physics 28 2004 265
19. Y.H. Kim, and J.C. Lee Hf-based High-k Dielectrics: Process Development, Performance Characterization, and Reliability, Synthesis Lectures on Solid State Materials and Devices 1 2006 1 92
20. M. Modreanu, J. Sancho-Parramon, O. Durand, B. Servet, M. Stchakovsky, C. Eypert, C. Naudin, A. Knowles, F. Brido, and M.-F. Ravet Applied Surface Science 253 2006 328
21. Y.K. Voronko, A.A. Sobol, and V.E. Shukshin Physics of Solid State 49 2007 1963
22. P.E. Quintard, P. Barbéris, A.P. Mirgorodsky, and T. Merle-Méjean Journal of American Ceramic Society 85 2005 1745
23. A. Jayarama, S.Y. Wang, S.K. Sharma, and L.C. Ming Physical Review B 48 1993 9205
24. M.A. Schofiled, C.R. Aita, P.M. Rice, and M. Gajdardziska-Josifovska Thin Solid Films 326 1998 106
25. H. Kuzmany Solid-state Spectroscopy: An Introduction 2009 Springer Berlin
26. E. Anastassakis, B. Papanicolaou, and I.M. Asher Lattice dynamics and light scattering in hafnia and zirconia Journal of Physics and Chemistry of Solids 36 1975 667
27. A.S. Barker, and A.J. Sievers Reviews of Modern Physics 47 1975 S1 S179