Preferred orientation in sputtered TiO 2 thin films and its effect on the photo-oxidation of acetaldehyde

Chemistry of Materials

Volumn 24, Issue 17, 2012, Pages 3355-3362

  Lyandres, Olga ^a   Finkelstein Shapiro, Daniel ^b   Chakthranont, Pongkarn ^a,c   Graham, Michael ^a   Gray, Kimberly A ^a  

^a Northwestern University   (United States)

^b NORTHWESTERN UNIVERSITY   (United States)

^c Stanford University   (United States)

Author keywords

biaxial orientation; photocatalysis; sputtering; texture; thin films; TiO 2

Indexed keywords

ACTIVE SITE; BIAXIAL ORIENTATION; BIAXIAL TEXTURES; CRYSTALLINITIES; CRYSTALLOGRAPHIC ORIENTATIONS; DEGRADATION OF ACETALDEHYDE; DEGREE OF ORIENTATION; DIRECT CURRENT MAGNETRON SPUTTERING; FIBER TEXTURE; FILM SURFACES; FILM TEXTURES; GRAZING-INCIDENCE X-RAY DIFFRACTION; INDIRECT MEASURE; PARAMETER SPACES; POLE FIGURE; PREFERRED ORIENTATIONS; RADIO FREQUENCIES; REACTIVE GAS; RF BIAS; SOLID-SOLID INTERFACES; SYNTHESIS CONDITIONS; SYNTHESIS PARAMETERS; TIO;

DEGRADATION; OXIDE MINERALS; PHOTOCATALYSIS; PHOTOREACTIVITY; SCANNING ELECTRON MICROSCOPY; SPUTTERING; TEXTURES; THIN FILMS; TITANIUM DIOXIDE; X RAY DIFFRACTION;

ACETALDEHYDE;

EID: 84866114563     PISSN: 08974756     EISSN: 15205002     Source Type: Journal    
DOI: 10.1021/cm301173j     Document Type: Article

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