Growth mechanism of biaxially aligned Magnesium Oxide deposited by unbalanced magnetron sputtering

Solid State Phenomena

Volumn 105, Issue , 2005, Pages 433-438

  Ghekiere, P ^a   Mahieu, S ^a   De Winter, G ^a   De Gryse, R ^a   Depla, D ^a   Lebedev, O I ^b  

^a GHENT UNIVERSITY   (Belgium)

^b UNIVERSITY OF ANTWERP   (Belgium)

Author keywords

Biaxial alignment; Growth mechanism; MgO; Unbalanced magnetron sputtering

Indexed keywords

COPPER OXIDES; MAGNETRON SPUTTERING; SCANNING ELECTRON MICROSCOPY; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

AMORPHOUS SUBSTRATES; INDIUM TIN OXIDE (ITO); ION BEAM ASSISTED DEPOSITION (IBAD); YTTRIA STABILIZED ZIRCONIA (YSZ);

MAGNESIUM COMPOUNDS;

EID: 19344371565     PISSN: 10120394     EISSN: None     Source Type: Book Series    
DOI: 10.4028/3-908451-09-4.433     Document Type: Conference Paper

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